Race Intensifies To Develop EUV Source


By David Lammers The technology competition to supply the source of EUV radiation for the next-generation lithography tools has long been divided between the laser-produced plasma (LPP) approach, favored by Cymer (San Diego) and Gigaphoton (Oyama, Japan), and the discharge -produced plasma (DPP) method supported by Xtreme Technologies (Aachen, Germany). The competition is heating up, and it... » read more

EUV Focus Shifts To Affordability


By David Lammers Over the past year, key technologists in the semiconductor industry have come around to believing that EUV lithography will be available for critical mask layers in the next three to five years. What is still up for debate is whether EUV will be cost-effective for low-power consumer SoCs. To penetrate that cost-sensitive market, EUV must overcoming hurdles presented by masks, ... » read more

Pricey Processes For Low Power


By Pallab Chatterjee Recently Samsung gave an update on the status and availability of its advanced 32/28nm process technology for use in foundry. The process is targeted for shipping designs to customers at the end of this year, with a road map that continues through the 22/20nm nodes and down to 15nm. What was particularly interesting were several key innovations that have made this all p... » read more

Software Becomes The Main Differentiating Factor


By Ed Sperling Software has always been critical in determining what makes one chip different from another, but for the next couple of process nodes it will take on new significance. Rather than just defining function, it also will be one of the key determinants in performance and function. Behind this change is a bottleneck in lithography, which generally is not something most design eng... » read more

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