tag: Applied Materials

The Week In Review: Manufacturing
By Mark LaPedus - 21 Apr, 2017 - Comments: 0

Fab tool vendors In the wafer fab equipment (WFE) rankings, Applied Materials was the leader in terms of market share in 2016, according to Gartner. For WFE, Lam Research jumped from fourth place in 2015 to second place in the rankings in 2016, according to Gartner. ASML was third, followed by TEL. Meanwhile, VLSI Research recently released its ranking for both front-end and backend equipment.... » read more

Sizing up China’s Fab Tool Biz
By Mark LaPedus - 20 Apr, 2017 - Comments: 0

China is pouring billions of dollars into its semiconductor industry and is building several new fabs. As reported, China is bolstering its IC industry for good reason. China is trying to reduce its huge trade imbalance in ICs. The country continues to import a large percentage of its chips from foreign vendors. Behind the scenes, China also continues to develop its domestic semiconductor eq... » read more

Moore’s Law: A Status Report
By Ed Sperling - 20 Apr, 2017 - Comments: 3

Moore's Law has been synonymous with "smaller, faster, cheaper" for the past 52 years, but increasingly it is viewed as just one of a number of options—some competing, some complementary—as the chip industry begins zeroing in on specific market needs. This does not make [getkc id="74" comment="Moore's Law"] any less relevant. The number of companies racing from 16/14nm to 7nm is higher t... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 14 Apr, 2017 - Comments: 0

Fab equipment and test VLSI Research has released its top 10 semiconductor equipment supplier ranking in terms of sales in 2016. Applied Materials topped the list again, achieving a growth of 18%. ASML was second, followed by Lam Research, TEL and KLA-Tencor. Fig. 1: Ranking based on 2016 sales. Source: VLSI Research. Unic Capital Management, a Chinese-based private equity fund, announ... » read more

Electroplating IC Packages
By Mark LaPedus - 10 Apr, 2017 - Comments: 2

The electrochemical deposition (ECD) equipment market for IC packaging is heating up as 2.5D, 3D and fan-out technologies begin to ramp. [getentity id="22817" e_name="Applied Materials"]  recently rolled out an ECD system for IC packaging. In addition, Lam Research, TEL and others compete in the growing but competitive ECD equipment market for packaging. ECD—sometimes referred to as pl... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 31 Mar, 2017 - Comments: 0

Chipmakers At an event, Intel’s Technology and Manufacturing group outlined the company's vision. As part of the event, Intel reiterated what many are saying—the current node designations are meaningless and misleading. “For example, Intel estimates that its 14nm solution that has been out in the market since 2014 should be equal to 10nm solutions released by competitors in the near futu... » read more

Patterning Problems Pile Up
By Mark LaPedus - 20 Mar, 2017 - Comments: 4

Chipmakers are ramping up 16nm/14nm finFET processes, with 10nm and 7nm now moving into early production. But at 10nm and beyond, chipmakers are running into a new set of problems. While shrinking feature sizes of a device down to 10nm, 7nm, 5nm and perhaps beyond is possible using current and future fab equipment, there doesn't seem to be a simple way to solve the edge placement error (EPE)... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 17 Mar, 2017 - Comments: 0

Chipmakers At this week’s TSMC Technology Symposium in San Jose, Calif., TSMC rolled out a dizzying array of new processes and technologies. Perhaps the most surprising announcement was a 22nm bulk CMOS process, which is geared for ultra low-power planar chips. The technology will compete against a 22nm FD-SOI technology from GlobalFoundries. Stay tuned. The battle has just begun. As e... » read more

Following Multiple Patterns
By Mark LaPedus - 16 Mar, 2017 - Comments: 2

The lithography market is in flux. Today, chipmakers plan to extend today’s 193nm immersion lithography and multi-patterning to at least 10nm and 7nm. For the most critical layers, though, it’s unclear if optical lithography can extend beyond 7nm. For that reason, chipmakers hope to insert extreme ultraviolet (EUV) lithography at 7nm and/or 5nm. To get a handle on the state of patterning, S... » read more

What’s New On The MEMS Horizon?
By Mike Rosa - 16 Mar, 2017 - Comments: 0

In my previous blog post, I discussed emerging trends and the increased demand for MEMS; now I’ll focus on what we can expect in the immediate future in terms of new device technologies and MEMS-enabled products. While the more well-known MEMS such as accelerometers, gyroscopes, microphones and pressure sensors continue to grow in volume as they find new applications in things like wire... » read more

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