tag: Carl Zeiss

Week In Review: Manufacturing, Test
By Mark LaPedus - 21 Dec, 2018 - Comments: 0

Chipmakers Foxconn is in talks to build a fab in Zhuhai, China, according to a report from Nikkei. The fab, to cost $9 billion, would make chips for Foxconn and outside companies, the report said, which says the company will enter the foundry business. The European Commission has approved funding for 1.75 billion euros ($2 billion) of public investment for projects in the microelectronics... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 28 Apr, 2017 - Comments: 0

Chipmakers United Microelectronics Corp. (UMC) has expanded its process portfolio within its joint fab venture in China. The Taiwan government has approved UMC’s application to license its 28nm technology to its subsidiary company in China--United Semiconductor. The subsidiary has been ramping up 40nm technology. “This licensing approval will help Fab 12X to ramp its manufacturing scale, e... » read more

Mask Maker Worries Grow
By Mark LaPedus - 22 Sep, 2016 - Comments: 0

Photomasks are becoming more complex and expensive at each node, thereby creating a number of challenges on several fronts. For one thing, the features on the [getkc id="265" kc_name="photomask"] are becoming smaller and more complex at each node. Second, the number of masks per mask-set are increasing as a result of multiple patterning. Third, it costs more to build and equip a new mask fab... » read more

Coming To A Fab Near You?
By Katherine Derbyshire - 21 Jan, 2016 - Comments: 1

What do Quentin Tarantino and ASML have in common? Anamorphic lenses. The optical image created by an anamorphic lens is oval, rather than round, with different magnifications along the horizontal and vertical axes. Tarantino used 65mm anamorphic lenses to film The Hateful Eight, and some theaters are also using them to screen the movie. It’s the first fiction feature to use this format s... » read more

Wanted: New Metrology Funding Models
By Mark LaPedus - 21 Mar, 2013 - Comments: 0

By Mark LaPedus The shift toward the 20nm node and beyond will require new and major breakthroughs in chip manufacturing. Most of the attention centers around lithography, gate stacks, interconnects, strain engineering and design-for-manufacturing (DFM). Lost in the conversation are two other critical but overlooked pieces in the manufacturing puzzle—wafer inspection and metrology. ... » read more

Mask Repair Enters The Spotlight
By Ed Sperling - 18 Oct, 2012 - Comments: 0

By Mark LaPedus For years, the biggest challenges in photomask manufacturing have revolved around the slow write times for electron-beam tools and soaring mask inspection costs. Now, photomask repair, a sometimes forgotten technology in the mask shop, is in the spotlight and turning into the clash of the titans. Mask repair involves the process of finding defects on a photomask and repairin... » read more

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