CMOS 2.0: Layered Logic For The Post-Nanosheet Era


The semiconductor industry has relied on a simple equation for more than five decades — shrink the transistor, pack more onto every wafer, and watch performance soar as costs plummet. While each new node delivered predictable gains in speed, power efficiency, and density, that formula is rapidly running out of steam. As transistors approach single-digit nanometer processes, manufacturing c... » read more

AI In The IC Equipment Ecosystem


AI is playing an increasingly critical role in improving semiconductor equipment and processes, which are necessary as the industry moves to advanced manufacturing processes. This requires more steps, tighter integration and analysis of those various steps, and better optimization of tools. David Fried, corporate vice president at Lam Research, talks about how to accelerate the development of A... » read more

Startup Funding: Q2 2025


Investors were drawn to a wide range of innovative approaches in Q2 2025, backing startups developing superconducting logic, chips for an emerging number format, big data processors, and novel power semi architectures. At the same time, photonics continues to draw investment dollars due to its ability to move data faster and with less energy at both the chip-to-chip and data center levels. T... » read more

Examining Mechanical Deformation In Advanced Logic Devices To Enhance Yield


By Sandy Wen and Jacky Huang As dimensions shrink and aspect ratios increase in advanced logic devices, it is increasingly important to reduce structural device variation. Structural device variations can be a proxy for device yield. These variations might include critical dimension (CD), gate CD, gate height, and proximity between neighboring vias. One contributor to structural device v... » read more

Power Delivery Challenges For AI Chips


As artificial intelligence (AI) workloads grow larger and more complex, the various processing elements being developed to process all that data are demanding unprecedented levels of power. But delivering this power efficiently and reliably, without degrading signal integrity or introducing thermal bottlenecks, has created some of the toughest design and manufacturing challenges in semiconducto... » read more

How An Environmental Sustainability Community Fostered Employee-Driven Innovation


Co-written by S. Sinan Erzurumlu (Babson College), Wojciech T. Osowiecki (Lam Research) and Victor P. Seidel (Babson College). Firms are increasingly promoting innovations that advance environmental sustainability across all aspects of their business, but this can be challenging in global, complex, technology-focused organizations. Much research has focused on top-down strategic initiatives;... » read more

Blog Review: June 4


In a podcast, Siemens’ Conor Peick, Dale Tutt, and Mike Ellow chat about the implications of the software-defined transition, how it affects semiconductor development, and why it seems to be leading more companies towards developing their own silicon. Cadence’s Vinod Khera shows off a Linux-based audio development platform for prototyping AI audio applications with support for real-time ... » read more

Laser-Focused Results: Improving EUV Line Edge Roughness With Ion Beam Etching


Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure dose can reduce LER/LWR, but it also decreases wafer throughput, which is highly undesirable given the EUV tool’s high operating costs. Ion beam etching (IBE) can directionally etch away roug... » read more

Molybdenum: Transforming Semiconductor Manufacturing For Next-Generation Technologies


One trillion semiconductors produced in a single year. A digital foundation powering AI's explosive growth. The next frontier requires chips that are smaller, faster, and exponentially more powerful. A new white paper from Counterpoint Research  reveals how advanced metallization—specifically molybdenum—is becoming a critical enabler for semiconductor manufacturing in this new era. Th... » read more

Blog Review: May 14


Siemens’ Stephen V. Chavez finds that proper PCB high voltage spacing between conductive elements is key to reliability and understanding the principles of clearance (through-air spacing) and creepage (along-surface spacing) is critical. Cadence’s Frank Ferro checks out how the new HBM4 standard boosts bandwidth and addresses key issues in the data center, including the growing size of L... » read more

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