Semiconductor Metrology: IMMSE For The Rapid ID of Defective Chips (Samsung)


A new technical paper titled "Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology" was published by researchers at Samsung. Abstract "We propose an ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry (IMMSE) system for semiconductor metrology. The IMMSE system achieves large-area measurements with a 20 mm × 20 mm field of ... » read more