Big Changes In Patterning

Aki Fujimura, CEO of [getentity id="22864" comment="D2S"], sat down with Semiconductor Engineering to discuss patterning issues at 10nm and below, including mask alignment, the need for GPU acceleration, EUV's future impact on the total number of masks, and what the re-introduction of curvilinear shapes will mean for design. SE: Patterning issues are getting a lot of attention at 10nm and 7n... » read more

Double Patterning: Challenges And Possible Solutions In Parasitics Extraction

By Dusan Petranovic and David Abercrombie Double patterning (DP), as the simplest form of multi-patterning techniques, is receiving lots of attention right now. The need for double patterning techniques is driven by the physical limits of the dimensions that can be resolved with current light sources and lenses, as well as by the difficulties and delays in deploying next-generation lithography... » read more