Accelerating Computational Lithography With GPU Rasterization


By Loay Hegazy, Mohamed Taher, and Sherif Hammouda Semiconductor manufacturing at advanced nodes has become a race against physics. Even as feature sizes shrink, the tools that design and validate these circuits must operate with precision and speed. We show in a recent research paper that one part of the post-tapeout flow, rasterization, can be significantly sped up by deploying GPUs for ma... » read more

Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced Lithography + Patterning 2026


Leading‑edge system-on-chip (SoC) designs at deep submicron nodes are stretching lithography and patterning capabilities across the entire manufacturing flow. Extreme ultraviolet (EUV) lithography has become central to printing advanced features, using high‑power pulsed lasers to generate a plasma light source and reflective optics to project mask patterns onto the wafer. As error budgets t... » read more

Faster Mask Synthesis With GPUs


Design teams face rising pressure to deliver larger chips with higher transistor densities on tighter schedules using advanced node processing. The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design to every step of the development flow, including manufacturing, where photolithography and mask synthesis must keep pace. This po... » read more