Chip Industry Week in Review


San Francisco-based Substrate raised more than $100 million to build a vertically integrated foundry that uses particle accelerators to produce "the world's brightest beams, enabling a new method of advanced X-ray lithography." The company claims its technology is comparable to ASML's high NA EUV, and notes it can extend well beyond 2nm. ASML has not publicly commented. The Nexperia chip sho... » read more

A Lens Designer’s View Of Metaoptics: Aberration Theory For Flat Optics


By Dr. John R. Rogers and Dr. Yijin Ding. This paper covers a discussion of the Abbe Sine Condition and its implication for Flat Optics, including the effects of stop shift and substrate curvature. Following that, we apply Sweatt’s high index model of diffractive effects to develop a third-order aberration theory for diffractive, meta-, and hybrid optical systems, including the pos... » read more