Photomask Japan 2025: A Strong Signal For The Future Of Our Industry


Photomask Japan (PMJ) 2025 was, without a doubt, the most exciting edition I’ve attended in recent years. From a surge in attendance to a packed agenda full of technical depth and forward-looking insights, this year’s event reflected the growing momentum and innovation across the photomask and eBeam ecosystem. Let’s start with the numbers—624 attendees. That’s a significant jump fr... » read more

Three Ways Curvy ILT Together With PLDC Improves Wafer Uniformity


This is the second blog in a three-part series on pixel-level dose correction (PLDC). The first installment was “Improving Uniformity and Linearity for All Masks” from January 29, 2025. PLDC: A new solution for improving mask and wafer uniformity Improving mask uniformity is the easiest, cheapest way to improve wafer uniformity. Uniformity is a measure of how similarly the exact same feat... » read more

Making And Protecting Advanced Masks


Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at Photronics; Thomas Scheruebl, director of strategic business development and product strategy at Zeiss; Noriaki Nakayamada, senior technologist at NuFlare; and Aki Fujimura, chief executive of D2S. What fol... » read more