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Case Study: Monitoring Humidity To Reduce Reticle Haze Effects


Understanding reticle haze: Without proper control measures, immersion technology scanners are affected by an adverse phenomenon called “haze.” Haze is caused by a combination of three specific factors: Click here to continue reading. » read more

Mask Supply Chain Preps For 10nm


As the semiconductor industry gears up for the 10nm logic node—now likely to begin in the second half of 2017—the photomask supply chain is preparing to grapple with the associated challenges, including dramatic increases in photomask complexity, write times and data volumes. The 10nm node will require more photomasks per mask set, the ability to print smaller and more complex features, ... » read more