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What’s Next In AI, Chips And Masks


Aki Fujimura, chief executive of D2S, sat down with Semiconductor Engineering to talk about AI and Moore’s Law, lithography, and photomask technologies. What follows are excerpts of that conversation. SE: In the eBeam Initiative’s recent Luminary Survey, the participants had some interesting observations about the outlook for the photomask market. What were those observations? Fujimur... » read more

GPUs May Speed UP EDA Algorithms


The sequential EDA algorithms of old cannot keep pace with increasing design complexity, which is driving the industry to look at parallelism and other computational architectures such as the graphical processing unit (GPU). A 10X or 20X speedup for gate-level simulations means that a test that runs today in a week will run in less than a day, and a test that runs today in a month will run i... » read more