eBeam Initiative At SPIE ALP 2026: Continuing Progress On Curvilinear, EUV, And Data Challenges


The eBeam Initiative’s annual lunch at SPIE Advanced Lithography and Patterning has long served as a focal point for eBeam technology education for the industry. This year marked our 17th gathering, with approximately 150 attendees joining us. As in past years, the value of the session was less about any single topic and more about the collective signal across different parts of the ecosystem... » read more

Expert Panel Sees History Of Continuous Photomask Innovations As Key To The Future


The eBeam Initiative conducted its 14th annual eBeam Initiative Luminaries survey in July and reported the results on September 23, 2025 to more than 200 attendees at its annual meeting during the BACUS SPIE Photomask Technology conference. Industry luminaries representing 51 companies from across the semiconductor ecosystem—including photomasks, electronic design automation (EDA), chip desig... » read more