Systematic Lithographic Patterning Characterization Of An Al-based Hybrid Resist (Stonybrook, UT Dallas, Brookhaven)


A new technical paper titled "Molecular Layer Deposited Aluminum-Based Hybrid Resist for High-Resolution Nanolithography and Direct Ultra-High Aspect Ratio Pattern Transfer" was published by researchers at Stony Brook University, the University of Texas at Dallas, and Brookhaven National Laboratory. Excerpt "Here, this study reports the systematic lithographic patterning characterization ... » read more