Reducing And Optimizing Power


While power optimization/reduction techniques such as clock gating do help engineering teams improve designs from a power perspective, more can be done. In fact, there are tools and methodologies under development to incorporate power in a more meaningful way. Part of that involves accurately pinpointing what designers should be looking for. “If you look at academia or research that has... » read more

Evolution Vs. Revolution


In the electronic design automation industry changes to tools and flows are nearly always evolutionary. They hide as much change from the user as possible, allowing easier justification from an ROI perspective, and they raise far fewer objections from users, who don’t have to spend time learning how to use new technology or rethink tried and true approaches to problems. Revolution in chip ... » read more

10 Must Knows About Virtual Prototypes


1. What is a virtual prototype? If you ask a room full of people to define ‘system’, you will get as many answers as there are people in the room. The same is true for virtual prototypes. A virtual prototype defines a model of something that is usually created by one group and used by another with some implied abstraction. It is a prototype that exists as a software model on which analysis... » read more

Abstractions: The Good, Bad And Ugly


Raising the level of abstraction has become almost a mantra among chipmakers and tools developers. By moving the vantage point up a couple rungs on the ladder, it’s easier to see how the individual parts of a design go together, to identify problems in the design as well as fixes to problems, and it all can happen much more quickly. That’s the theory, at least. And in most cases, it’s ... » read more

EDA Hungers For Growth


Look at the top line numbers provided by the EDA industry consortium (EDAC) and it appears as if the industry is doing well. In 2010, revenue was $5.285 billion. That number increased to $6.218 billion in 2011, and again to $6.529 billion in 2012, a 9.5% annual growth rate that would satisfy most investors. But the numbers do not tell the whole story. There is an interesting divide growing betw... » read more

Is Verification At A Crossroads?


As SoC verification methodologies and technologies have continued to mature, it’s an interesting time for engineering teams as they look to meet time to market goals and cut costs in an environment of cutthroat profit margins. Whether it is hardware emulation, FPGA prototyping, virtual prototyping or traditional software simulation, each platform has its strengths and drawbacks, with overl... » read more

SoC Integration Mistakes


Semiconductor Engineering sat down to discuss integration challenges with Ruggero Castagnetti, distinguished engineer at LSI; Rob Aitken, an ARM fellow; Robert Lefferts, director of engineering in Synopsys’ Solutions Group; Bernard Murphy, chief technology officer at Atrenta; and Luigi Capodieci, R&D fellow at GlobalFoundries. What follows are excerpts of that roundtable discussion. S... » read more

EUV Suffers New Setback


ASML Holding’s initial, production-worthy extreme ultraviolet (EUV) lithography tool has suffered a setback during a recent trial run at Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC). TSMC disclosed the problem during a public presentation at the 2014 Advanced Lithography conference in San Jose, Calif. During the trial run at TSMC, the EUV source crashed due to a misalignment of the l... » read more

Are Processors Running Out Of Steam?


Check out any smart phone these days and you’ll find some reference to the number of cores in the device. It’s not the number of cores that makes a difference, though—or even the clock speed at which they run. Performance depends on the underlying design for how they’re utilized, how often that happens, how much memory they share, how much interaction there is between the cores, and the... » read more

New Challenges For Post-Silicon Channel Materials


In order to bring alternative channel materials into the CMOS mainstream, manufacturers need not just individual transistor devices, but fully manufacturable process flows. Work presented at the recent IEEE Electron Device Meeting (Washington, D.C., Dec. 9-11, 2013) showed that substantial work remains to be done on almost all aspects of such a flow. First and most fundamentally, it is diffi... » read more

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