Rethinking Differentiation


Differentiation is becoming more difficult, more time-consuming, and in some cases much more expensive for chipmakers. The traditional metrics of faster performance, lower power and less area/cost, which are leftovers from the PC era, no longer are a guarantee of success despite the fact that they are still baseline metrics for many designs. Even new metrics such as ecosystem completeness, w... » read more

Electronics Butterfly Effect


Everyone has heard of the butterfly effect where a small change in a non-linear system can result in large difference in an outcome. For the past 40 years, the electronics industry has approximated a linear system, fed primarily by Moore’s Law. The incremental changes available at each new process node have led us to make incremental changes and improvements in many aspects of the design, its... » read more

Interconnect Challenges Grow


It’s becoming apparent that traditional chip scaling is slowing down. The 16nm/14nm logic node took longer than expected to unfold. And the 10nm node and beyond could suffer the same fate. So what’s the main cause? It’s hard to pinpoint the problem, although many blame the issues on lithography. But what could eventually hold up the scaling train, and undo Moore’s Law, is arguably t... » read more

Challenges At Advanced Nodes


Semiconductor Engineering sat down to discuss finFETs, 22nm FD-SOI and how the how the market will segment over the next few years with Marie Semeria, CEO of [getentity id="22192" e_name="Leti"]; Patrick Soheili, vice president of product management and corporate development at [getentity id="22242" e_name="eSilicon"]; Paul Boudre, CEO of Soitec; and Subramani Kengeri, vice president of global ... » read more

2.5D Creeps Into SoC Designs


A decade ago top chipmakers predicted that the next frontier for SoC architectures would be the z axis, adding a third dimension to improve throughput and performance, reduce congestion around memories, and reduce the amount of energy needed to drive signals. The obvious market for this was applications processors for mobile devices, and the first companies to jump on the stacked die bandwag... » read more

Executive Insight: Aart de Geus


Aart de Geus, chairman and co-CEO of Synopsys, sat down with Semiconductor Engineering to talk about acquisitions, software and EDA. What follows are excerpts of that interview, which was conducted in front of a live audience at DAC. SE: A lot of Synopsys' investments are moving in a new direction, namely software. Why is that becoming so important to your company? De Geus: It's not a dif... » read more

Technology Tsunami Approaches


How many times have we heard the saying that technology advancements are accelerating and that inevitably the older generation will have increasing problems keeping up with the new advancements? This happened to me with software development methodologies over fifteen years ago. I still program, when people actually let me, using basically the same techniques I learned when I was in my teens.... » read more

What Will 7nm And 5nm Look Like?


Citing an assortment of undisclosed manufacturing issues, Intel in July pushed out the introduction of its 10nm chip and process technology to the second half of 2017. This is roughly six or more months later than expected. With the delay at 10nm, [getentity id="22846" e_name="Intel"] also pushed out its process cadence from 2 to 2.5 years. Other foundries, meanwhile, are struggling to keep ... » read more

Power Breaks Everything


The emphasis on lowering power in everything from wearable electronics to data centers is turning into a perfect storm for the semiconductor ecosystem. Existing methodologies need to be fixed, techniques need to be improved, and expectations need to be adjusted. And even then the problems won't go away. In the past, most issues involving power—notably current leakage, physical effects such... » read more

Here Comes 7nm


A consortium of companies involving IBM, GlobalFoundries and Samsung has rolled out the first 7nm test chip using silicon germanium as a substrate, using EUV to pattern multiple layers. While this doesn't mean the cost equation is even close to being solved, or that more than a handful of companies will push forward to that node anytime soon using SiGe as the substrate material, it does cre... » read more

← Older posts Newer posts →