tag: Applied Materials

Blog Review: Oct. 19
By Jesse Allen - 19 Oct, 2016 - Comments: 0

Mentor's Colin Walls provides some tips on writing portable, reusable code. Cadence's Christine Young contends that you should never use 2.5D for characterization at advanced nodes. Synopsys' Eric Huang considers one impractical use of USB heating and the IoT. Applied's Ben Lee predicts a rapid growth in China's power device manufacturing. NXP's Joppe Bos digs into the challenges of... » read more

Lam, KLA-Tencor Scrap Merger
By Mark LaPedus - 05 Oct, 2016 - Comments: 0

After a series of delays due to regulatory issues, Lam Research and KLA-Tencor have agreed to terminate their proposed merger agreement. Last year, Lam entered into a definitive agreement to acquire KLA-Tencor for about $10.6 billion. Lam’s proposed and blockbuster move to acquire KLA-Tencor would supposedly create the world’s second largest fab tool maker, behind Applied Materials. O... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 23 Sep, 2016 - Comments: 0

Fab tools and T&M Applied Materials and the Institute of Microelectronics (IME), a research institute under the Agency for Science, Technology and Research (A*STAR), have announced a five-year extension of their R&D collaboration at the Centre of Excellence in Advanced Packaging in Singapore. The organizations will expand the scope of their R&D collaboration to focus on advancing fan-out wafer... » read more

Will III-V Power Devices Happen?
By Ben Lee - 22 Sep, 2016 - Comments: 0

In a previous blog post, I provided a review of the overall power device market and trends driving changes in device evolution that entail materials innovation. For the industry to make such a shift, the advantages over mature, low-cost silicon technologies must be compelling and something the industry absolutely has to implement. Now I’d like to focus on new materials offering competitive be... » read more

Mask Maker Worries Grow
By Mark LaPedus - 22 Sep, 2016 - Comments: 0

Photomasks are becoming more complex and expensive at each node, thereby creating a number of challenges on several fronts. For one thing, the features on the [getkc id="265" kc_name="photomask"] are becoming smaller and more complex at each node. Second, the number of masks per mask-set are increasing as a result of multiple patterning. Third, it costs more to build and equip a new mask fab... » read more

Sorting Out Next-Gen Memory
By Mark LaPedus - 22 Sep, 2016 - Comments: 8

In the data center and related environments, high-end systems are struggling to keep pace with the growing demands in data processing. There are several bottlenecks in these systems, but one segment that continues to receive an inordinate amount of attention, if not part of the blame, is the memory and storage hierarchy. [getkc id="92" kc_name="SRAM"], the first tier of this hierarchy, is... » read more

Blog Review: Sept. 21
By Jesse Allen - 21 Sep, 2016 - Comments: 0

Mentor's Ricardo Anguiano takes a look at a proposal to prevent auto accidents from becoming pile-ups: the relaying of hazard information to the cloud and on to upcoming vehicles. Why get rid of 3.5mm audio jacks? Synopsys' Michael Posner says it's all about the power optimization in the upcoming USB Type-C digital audio specification. NXP's Anand Kannan also thinks Type-C should be the d... » read more

Blog Review: Sept. 14
By Jesse Allen - 14 Sep, 2016 - Comments: 0

Are wide bandgap lll-V power devices feasible? Applied's Ben Lee considers the challenges, and potential rewards, of silicon carbide and gallium nitride. DVCon India chair Gaurav Jalan chats with keynote speaker Alok Jain about the challenges of verifying complex SoCs, the unique verification needs of the IoT, and what might lie beyond UVM. From power intent abstraction to automatic power... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 19 Aug, 2016 - Comments: 0

Fab tool and material vendors Applied Materials reported its results for the third quarter ended July 31. Net sales of $2.82 billion were up 15% sequentially and up 13% year over year. "AMAT reported impressive upside in July quarter and guided October quarter well ahead of expectations as the company is seeing sizable tailwinds across: 1) WFE uptick driven by foundry and NAND orders; 2) stron... » read more

Fins And Wires – How Do We Get To 5nm?
By Mike Chudzik - 18 Aug, 2016 - Comments: 0

As the industry moves beyond 10nm to the 7nm and 5nm nodes, fundamental shifts are needed to address scaling challenges. Among the priority concerns driving industry changes, particularly with respect to materials and architecture, is the impact on transistor performance from rising parasitic resistance and parasitic capacitance or RC. I spoke about this industry dilemma recently at the SEMICON... » read more

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