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Manufacturing Bits: Oct. 5


EUV lithography storage ring At the recent SPIE Photomask Technology + EUV Lithography conference, Japan’s High Energy Accelerator Research Organization (KEK) presented a paper on its latest efforts to develop a free-electron laser (FEL) storage ring source power unit for extreme ultraviolet (EUV) lithography. KEK has demonstrated a proof-of-concept EUV-FEL, which has been in R&D. EUV-FEL... » read more