tag: Intel

EUV Remains Elusive
By Ed Sperling - 31 Jul, 2012 - Comments: 0

By David Lammers Intel’s decision to invest as much as $4.1 billion in ASML has raised overall confidence levels in EUV lithography, and should allow the Dutch lithography vendor to funnel more funds into the stubbornly difficult effort to raise the EUV source power. ASML has said it needs to reach 250 Watts of average source power to achieve the 125 wph throughputs sought by its early cu... » read more

DSA Moves To R&D Pilot Lines
By Ed Sperling - 31 Jul, 2012 - Comments: 0

By Mark LaPedus Directed self-assembly (DSA), an alternative lithography technology that makes use of block copolymers, is still in the R&D stage for semiconductor production. But as the exotic patterning technology continues to make astounding progress, there are signs the IC industry is accelerating its efforts to bring DSA from the lab to the fab. In fact, DSA suddenly has become a ... » read more

Investment Options
By Ed Sperling - 31 Jul, 2012 - Comments: 0

It's clear that something fundamental has changed in the semiconductor manufacturing industry. What's less clear is how this will play out over the long term. Intel's agreement to invest more than $4 billion in ASML to ensure the continued development of EUV and 450mm wafer technology is more than just a one-off deal. It's a very public recognition that the astronomical cost of design and ma... » read more

SoC Platforms Gain Steam
By Ed Sperling - 26 Jul, 2012 - Comments: 0

By Ed Sperling Platforms are attracting far more attention from makers of SoCs because they are pre-verified and can speed time to market, but the shift isn’t so simple. It will spark major changes in the way companies design and build chips, causing significant disruption across the entire SoC ecosystem. Platforms are nothing new in the processor and software world. Intel, IBM AMD, and N... » read more

More Design Rules Ahead
By Ed Sperling - 25 Jul, 2012 - Comments: 0

By Ed Sperling & Mark LaPedus For those companies that continue to push the limits of feature shrinkage, designs are about to become more difficult, far more expensive—and much more regulated. Two converging factors will force these changes. First, the limits of current 193nm immersion lithography mean companies now must double pattern at 20nm, and potentially quadruple pattern at 14n... » read more

28, 20nm Nodes Demand Advanced Power Management
By Ed Sperling - 12 Jul, 2012 - Comments: 0

By Ann Steffora Mutschler With the complexity of getting 28 and 20nm designs to reach desired yields with the desired power and performance on the shoulders of design teams, advanced power management techniques are a must. Sub-clock power gating, clock power gate structures, adaptive body bias and other techniques are making it possible. Sub-Clock Power Gating Far from a new techniqu... » read more

Four Factors Driving Processor Choices
By Ed Sperling - 12 Jul, 2012 - Comments: 0

By Ed Sperling Choosing processors for an SoC, a system-in-package, or even a complete system is becoming much more difficult, and the challenge is growing as demands on performance, power, area and time to market continue to increase. There are many reasons why this is becoming more difficult—and some designs will require more tradeoffs than others, depending upon IP re-use or a particul... » read more

Dealing With Variability
By Barry Pangrle - 12 Jul, 2012 - Comments: 0

By Barry Pangrle Process, voltage and temperature, a.k.a. PVT, are well known to designers who are working to complete “signoff” for their designs. In order for a design to be production-ready, it’s necessary to ensure that the design is going to yield parts at a sufficiently high percentage for profitability and that it will still operate within the expected variation of the process and... » read more

Experts At The Table: Pain Points
By Ed Sperling - 12 Jul, 2012 - Comments: 0

By Ed Sperling Low-Power/High-Performance Engineering sat down with Vinod Kariat, a Cadence fellow; Premal Buch, vice president of software engineering at Altera; Vic Kulkarni, general manager of Apache Design; Bernard Murphy, CTO at Atrenta, and Laurent Moll, CTO at Arteris. What follows are excerpts of that conversation. LPHP: Where will the pain points be going forward? Kariat: 20nm is... » read more

Disaggregation And Re-aggregation
By Ed Sperling - 02 Jul, 2012 - Comments: 0

The proliferation of platforms, subsystems and IP of any sort, as well as the move to stack die in 2.5D configurations, will force a realignment of the ecosystem. For the moment, it appears that vertically integrated companies such as Apple and Samsung have a distinct advantage. It remains to be seen just how substantial that advantage really is, however. As chips become a collection of more... » read more

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