tag: Lam Research

Searching For 3D Metrology
By Mark LaPedus - 19 Mar, 2015 - Comments: 3

In the previous decade, chipmakers made a bold but necessary decision to select the [getkc id="185" kc_name="finFET"] as the next transistor architecture for the IC industry. Over time, though, chipmakers discovered that the finFET would present some challenges in the fab. Deposition, etch and lithography were the obvious hurdles, but chipmakers also saw a big gap in metrology. In fact,... » read more

Issues And Options At 5nm
By Mark LaPedus - 19 Mar, 2015 - Comments: 0

While the foundries are ramping up their processes for the 16nm/14nm node, vendors are also busy developing technologies for 10nm and beyond. In fact, chipmakers are finalizing their 10nm process offerings, but they are still weighing the technology options for 7nm. And if that isn’t enough, IC makers are beginning to look at the options at 5nm and beyond. Today, chipmakers can see a p... » read more

Blog Review: March 18
By Jesse Allen - 18 Mar, 2015 - Comments: 0

How do you quantify effort spent in FPGA verification? Mentor's Harry Foster tackles the question in his latest installment of the Wilson Research Group functional verification study. A new frontier of design challenges is rapidly emerging, according to ARM CEO Simon Segars. Cadence's Brian Fuller brings us his keynote address at CDNLive. Synopsys' Tushar Mattu is back with more on AXI VI... » read more

Blog Review: March 11
By Jesse Allen - 11 Mar, 2015 - Comments: 0

How are sensors like a scallop's eyes? Rambus' Patrick Gill guides you through day in the life of the mollusk to show how inspiration for IoT was found in the sea. Cadence's Dimitry Pavlovsky discusses some of the intricacies associated with creating VIP for processor interconnect systems such as CHI, and how other tools are necessary to complete the task. Following Google's warning of a ... » read more

Blog Review: Feb. 25
By Jesse Allen - 25 Feb, 2015 - Comments: 0

Synopsys' Aron Pratt continues his series on SystemVerilog interfaces and strategies for dealing with parameterization. There are workarounds to the problems it introduces, but they come with a price. Mentor's John Day digs into Volvo's plans for autonomous autos. There are a lot of speedbumps ahead, and while it's easy to build a self-driving concept vehicle, actually getting on the road is... » read more

3D NAND Market Heats Up
By Mark LaPedus - 19 Feb, 2015 - Comments: 4

After some delays and uncertainty in past years, the 3D NAND market is finally heating up. In 2013 and 2014, Samsung was the only vendor participating in the 3D NAND market. Most other suppliers were supposed to ship 3D NAND devices in volumes last year, but vendors pushed out their production dates for various business and technical reasons. Going into 2015, [getentity id="22865" e_nam... » read more

One-On-One: Dave Hemker
By Mark LaPedus - 19 Feb, 2015 - Comments: 0

Semiconductor Engineering sat down to discuss process technology, transistor trends and other topics with Dave Hemker, senior vice president and chief technology officer at [getentity id="22820" comment="LAM Research"]. SE: On the technology front, the IC industry is undergoing some new and dramatic changes. What are some of those changes? Hemker: We focus on what we call the inflections.... » read more

Still Waiting For III-V Chips
By Mark LaPedus - 19 Feb, 2015 - Comments: 0

For years, chipmakers have been searching for an alternative material to replace traditional silicon in the channel for advanced CMOS devices at 7nm and beyond. There’s a good reason, too: At 7nm, silicon will likely run out of steam in the channel. Until recently, chipmakers were counting on III-V materials for the channels, at least for NFET. Compared to silicon, III-V materials provide ... » read more

Blog Review: Feb. 11
By Jesse Allen - 11 Feb, 2015 - Comments: 0

Ansys' Bill Vandermark flags the top five engineering articles of the week. Check out the one about the latest attempt at cold fusion, which left researchers hiding behind a blast shield. The solar-powered car named Stella drove away with the prestigious "Best Technology Achievement" award at the 8th annual Crunchies Awards this week. NXP's Maurice Geraets sounds like a proud parent – with... » read more

Next Channel Materials?
By Mark LaPedus - 22 Jan, 2015 - Comments: 0

Chipmakers are making a giant leap from planar transistors to [getkc id="185" kc_name="finFETs"]. Initially, [getentity id="22846" e_name="Intel"] moved into finFET production at 22nm and is now ramping up its second-generation finFETs at 14nm. And the other foundries will enter the finFET fray at 16nm/14nm. So what’s next? Chipmakers will likely extend the finFET architecture to both 10nm... » read more

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