Optimizing EUV Source Efficiency With Radiation-Hydrodynamic Simulations (U. Of Osaka et al.)


Researchers from The University of Osaka, National Institute for Fusion Science, National Institutes for Quantum Science and Technology, and Osaka Metropolitan University, et al. have published “Optimization of EUV output by experimentally validated radiation-hydrodynamic simulations across a broad laser parameter space”.   Abstract “Practical requirements such as improving ... » read more

Boosting EUV Conversion Efficiency With 2-Micron Dual-Beam Laser Irradiation


Researchers from Utsunomiya University, RIKEN, The University of Tokyo, and Tohoku University, et al. have published “40% boost in extreme ultraviolet conversion efficiency via simultaneous dual-beam 2-µm laser irradiation”. Abstract “Scaling extreme ultraviolet (EUV) source power for next-generation lithography demands higher conversion efficiency (CE) at reduced per-pulse ene... » read more

Reaching For The Reset Button In Lithography


By Mark LaPedus Amid ongoing delays and setbacks, extreme ultraviolet (EUV) lithography and multi-beam e-beam have both missed the 10nm logic node. So for the present, chipmakers must take the brute force route at 10nm by using 193nm immersion with multiple patterning. Now, it’s time to hit the reset button. For the 7nm node, chipmakers currently are lining up the lithographic competition... » read more