The Quest For Curvilinear Photomasks


The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and the ability to manufacture those chips faster and cheaper. The question now is when will this technology move beyond its niche-oriented status and ramp up into high-volume manufacturing. For ye... » read more

Optimizing Tool Integration Is Essential To Design Success


By James Paris and Armen Asatryan The relationship between a place and route (P&R) application and the collection of system-on-chip (SoC) design implementation, analysis, and verification methodologies and tools has always been very much a two-way street. The P&R system is the base, if you will, of design implementation—it takes the virtual and makes it physical. However, it is use... » read more

Week in Review: IoT, Security, Autos


Products/Services The Networking for Autonomous Vehicles Alliance announces that Marvell Semiconductor is joining the NAV Alliance following its acquisition of Aquantia. Fourteen companies are in the industry organization, including Bosch, Continental, Nvidia, and Volkswagen. “The NAV Alliance is developing the platforms that will create the future of transportation and we believe that Multi... » read more

IIoT Grows, But So Do Risks


By Jeff Dorsch & Ed Sperling After years of fitful progress, [getkc id="78" kc_name="Industrial Internet of Things"] technology is gaining adoption on the factory floor, in the electrical power grid, and other areas that could do with greater amounts of data analysis and insights from a connected ecosystem. AT&T, General Electric, IBM, Verizon Communications, and other large ... » read more

Rule Deck Comparison Doesn’t Have To Be Difficult


Foundry rule decks change all the time, as foundries uncover new manufacturing issues, or the process changes, or design criteria are tightened to improve runtime or stability. Sometimes new versions of a user’s design rule checking (DRC) tool are released, and the results from the DRC run differ from the previous version. Or perhaps a company wants to compare results between rule decks from ... » read more

Deployment of OASIS In The Semiconductor Industry


The OASIS working group was first initiated in 2001, published the new format in March 2004, which was ratified as an official SEMI standard in September 2005. A follow-on initiative expanded the new standard to cover the needs of the mask manufacturing equipment sector with a derived standard called OASIS.MASK (P44) that was released in November 2005 and updated in May 2008. While there are ma... » read more