tag: patterning

5 Reasons EUV Will Or Won’t Be Used
By Michael Watts - 19 Mar, 2015 - Comments: 1

Digging into this subject, there are five metrics that count in a lithography tool: resolution, throughput, defects, overlay, and reliability. So what does the best data tell us about the current state and realistic prognosis for [gettech id="31045" comment="EUV"]. Semiconductor Engineering posed this question to Matt Colburn, senior manager for patterning research at [getentity id="22306" comm... » read more

LIFT Your 3D Printing Application
By Michael Watts - 09 Mar, 2015 - Comments: 0

A major focus at Photonics West 2015 was 3D additive manufacturing. There were sessions on laser additive processing, digital light fabrication, and MOEMS devices. In all sessions, there were papers about systems, materials processing and applications. Here are a few of the papers that caught my attention. Two photon fabrication was the most commonly reported technique, it is the only way to... » read more

Still Waiting For III-V Chips
By Mark LaPedus - 19 Feb, 2015 - Comments: 0

For years, chipmakers have been searching for an alternative material to replace traditional silicon in the channel for advanced CMOS devices at 7nm and beyond. There’s a good reason, too: At 7nm, silicon will likely run out of steam in the channel. Until recently, chipmakers were counting on III-V materials for the channels, at least for NFET. Compared to silicon, III-V materials provide ... » read more

Tech Talk: Inverse Lithography
By Ed Sperling - 11 Dec, 2014 - Comments: 0

D2S’ Leo Pang talks with Semiconductor Engineering about lithography, inverse lithography, photomasks, where the problems are, and what needs to be done to move forward. [youtube vid=mn8JWaP8Z68] » read more

Will Materials Derail Moore’s Law?
By Mark LaPedus - 13 Nov, 2014 - Comments: 0

Is Moore’s Law slowing down? Clearly, chipmakers are struggling to keep up with Moore’s Law these days. But one sometimes forgotten and critical technology could easily derail Moore’s Law--materials. In fact, the cost and complexity for electronic materials are increasing at each node. “Chemical and gas commodity procurement spends are growing rapidly due to process complexity and un... » read more

Signoff Intensity On The Rise
By The SE Staff - 15 Aug, 2014 - Comments: 2

By Ann Steffora Mutschler and Ed Sperling Lithography and signoff are crossing swords at 16/14nm and 10nm, creating new problems that raise questions about just how confident design teams will be when they sign off before tapeout — and how many respins are likely to follow. While designs at 20nm, 16nm and 14nm typically rely on colorless double patterning, at 10nm colors are mandatory. ... » read more

DSA: Hype Or Revolution?
By Michael Watts - 14 Aug, 2014 - Comments: 0

Directed self-assembly (DSA) has become the subject of a great deal of research attention in the lithography world, to the point where there were dedicated sessions at this year’s Advanced Lithography conference in February. So is this just another passing research fad, or is it a technology that will revolutionize semiconductor manufacturing? DSA utilizes a block copolymer that effectivel... » read more

Beyond Moore’s Law
By Michael Watts - 15 May, 2014 - Comments: 0

What do you make of all the different reports coming out of Advanced Lithography 2014 — the end of Moore's Law, continued problems with EUV, directed self-assembly assembly makes progress? An equipment insider, whose judgment I value, came back from the meeting and concluded, "We will see the end of Moore’s Law shrinks in 2020. After that, no one knows!” There is no way a $300B+ business ... » read more

Blog Review: March 26
By Ed Sperling - 26 Mar, 2014 - Comments: 0

Synopsys’ Eric Huang has discovered a video of Superman using a GoPro camera (scroll down to bottom of page). So this is what it’s like to stop bullets with your hand. Cadence’s Tom Hackett zeroes in on mobile interfaces in a video—SoC fabric, memory and chip-to-chip. Nice whiteboard drawing. Mentor’s Anil Khanna looks at a methodology for developing high-performance embedded so... » read more

Amazing New Materials
By Michael Watts - 20 Mar, 2014 - Comments: 0

Materials are fundamental to active photonics devices, and there were plenty of developments discussed at Photonics West 2014. Element Six was happy to talk about progress in making large single-crystal diamond and even larger polycrystalline diamond wafers. Carbon has a number of stable forms; diamond, graphite, nanotubes and amorphous carbon. The Element Six process uses CVD conditions in ... » read more

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