Manufacturing Bits: Nov. 9


Open-source EUV resist metrology Paul Scherrer Institute (PSI) has developed an open-source software technology for scanning electron microscopy (SEM) applications. The technology is targeted for EUV resist metrology. The technology, called SMILE (SEM-Measured Image Lines Estimator), is an open source software technology, which characterizes line and space patterns in a SEM. SMILE is used t... » read more

The Evolution Of High-Level Synthesis


High-level synthesis is getting yet another chance to shine, this time from new markets and new technology nodes. But it's still unclear how fully this technology will be used. Despite gains, it remains unlikely to replace the incumbent RTL design methodology for most of the chip, as originally expected. Seen as the foundational technology for the next generation of EDA companies around the ... » read more

Continuous Integration


In this article, I tackle the classic question engineers developing software for custom integrated circuits (ICs) grapple with constantly: How do I test my software before the hardware team gets me a working silicon chip? No ‘one size fits all’ solution is provided here (look for that alongside my pet unicorn); instead I detail an easy-to-use yet powerful approach to solve this proble... » read more

Software Driving More Hardware Designs


The influence of software engineers is growing inside of chip and systems companies, reversing a decades-old trend of matching the software to the fastest or most power-efficient hardware and raising as-yet unanswered questions about what will change in SoC design. The shift is particularly evident in chips developed for high-volume markets such as mobile phones and tablets. It's also happen... » read more