Blog Review: Apr. 3


Siemens' Keith Felton finds that high bandwidth memory integration poses significant challenges for package designers stemming from its unique architecture and stringent performance requirements. Synopsys' Gervais Fong finds out what's new in the USB4 v2 specification, some of its unique challenges involved in doubling the performance capabilities of the USB wired connection, and an intrigui... » read more

Blog Review: Mar. 27


Cadence's Steve Brown suggests that multi-die technologies will be a key part of the path toward a faster, more efficient chip ecosystem that can support the compressed development cycles now emerging in the automotive industry. Synopsys' John Swanson, Madhumita Sanyal, and Priyank Shukla point to the role of simulation in ensuring seamless operation in the Ethernet ecosystem though rigorous... » read more

Early STEM Education Key To Growing Future Chip Workforce


A key factor in building a domestic workforce for the chip industry is attracting kids to science, technology, engineering, and math (STEM) subjects at a younger age. That way they are more likely to follow through and attain the skills and degrees needed to enter the semiconductor job market. Industry and government are partnering with schools and community organizations to address the chal... » read more

Digital Twins Target IC Tool And Fab Efficiency


Digital twins have emerged as the hot "new" semiconductor manufacturing technology, enabling fabs to create a virtual representation of a physical system on which to experiment and optimize what's going on inside the real fab. While digital twin technology has been in use for some time in other industries, its use has been limited in semiconductor manufacturing. What's changing is the breadt... » read more

ESD Alliance And SEMI Efforts To Combat Design Automation Software Piracy


Piracy is a growing concern for all software providers, especially those of us with complex and specialized software, such as chip design automation software that is expensive to develop and maintain. That’s why the Electronic System Design Alliance (ESD Alliance), a SEMI Technology Community, spearheaded an industry joint development effort to develop a server certification protocol that ... » read more

Blog Review: March 20


Synopsys' Kiran Vittal delves into AI chips, including the expansion of chip design beyond traditional semiconductor companies, adoption of RISC-V, and the use of formal equivalence checking to verify complex AI datapaths. Siemens' Patrick McGoff points to a survey that suggests projects deploying design for manufacturing within a PCB design flow are more likely to be completed on-time, on-q... » read more

Blog Review: Mar. 13


Cadence's Geeta Arora explains the Address Translation Service in PCIe 6.0, which allows an I/O device to perform its own virtual to physical address translations without relying on the host's CPU to reduce latency and improve overall system performance. Synopsys' John Swanson, Jon Ames, Priyank Shukla, and Varun Agrawal highlight the upcoming 1.6T iteration of the Ethernet standard and the ... » read more

AI/ML Challenges In Test and Metrology


The integration of artificial intelligence and machine learning (AI/ML) into semiconductor test and metrology is redefining the landscape for chip fabrication, which will be essential at advanced nodes and in increasingly dense advanced packages. Fabs today are inundated by vast amounts of data collected across multiple manufacturing processes, and AI/ML solutions are viewed as essential for... » read more

Chip Industry Week In Review


By Adam Kovac, Gregory Haley, and Liz Allan. Cadence plans to acquire BETA CAE Systems for $1.24 billion, the latest volley in a race to sell multi-physics simulation and analysis across a broad set of customers with deep pockets. Cadence said the deal opens the door to structural analysis for the automotive, aerospace, industrial, and health care sectors. Under the terms of the agreement, 6... » read more

Blog Review: Mar. 6


Synopsys' Gandharv Bhatara notes that successfully deploying high-NA EUV will rely on computational lithography to provide accurate modeling of aberrations, compact 3D mask modeling, and expand inverse lithography to full-chip processing. Cadence's John Park argues for using a systematic and automated system for co-design and co-analysis of multi-die packages to reduce the margin for human e... » read more

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