Three Methods For Improving Planarization For Diverse Layouts In Advanced Nodes (Fraunhofer IPMS)


A new technical paper titled "Reduced Topography After Stop on Nitride (SON) STI CMP Through Improved Post-Bulk Planarity for Diverse Layouts in Advanced Nodes" was published by researchers at Fraunhofer IPMS. Abstract "Three methods for improving planarization in a ceria free, two step STI CMP process were investigated using patterned test wafers representing 2X nm technology. It was found... » read more

New Issues In Power Semiconductors


The number of challenges is growing in power semiconductors, just as it is in traditional chips. Thermal dissipation and gradients, new design rules, and layout issues need to be considered, especially in the context of higher voltage and increased performance demands. Roland Jancke, design methodology head in Fraunhofer IIS’ Engineering of Adaptive Systems Division, talks about issues in int... » read more