tag: TSMC

The Week In Review: Manufacturing
By Mark LaPedus - 28 Mar, 2014 - Comments: 0

RBC Capital Markets has raised its iPhone unit forecast for 2014 to 159.1 million from 156.7 million. The iPhone estimates reflect better-than-expected growth in the September quarter, according to RBC. So which chipmakers will benefit? In order, the companies with the most exposure into Apple are Cirrus Logic, Dialog Semiconductor, Triquint, Skyworks, Audience, Avago, Broadcom, Qualcomm, SanDi... » read more

Directed Self-Assembly Gains Momentum
By Mark LaPedus - 20 Mar, 2014 - Comments: 0

At last year’s SPIE Advanced Lithography symposium, directed self-assembly (DSA) grabbed the spotlight as chipmakers provided the first glimpse of their initial work and results with the technology. The results were stunning, thereby propelling DSA from a curiosity item to a possible patterning solution for next-generation devices. Last year, in fact, GlobalFoundries, IBM, Intel and Sams... » read more

Under The Radar At SPIE
By Mark LaPedus - 20 Mar, 2014 - Comments: 2

At the SPIE Advanced Lithography symposium, the best and brightest minds in the lithography, metrology, resist and design-for-manufacturing (DFM) fields assemble for a week. The annual event is a good way to get a pulse on the current state of lithography. At this year’s SPIE, it was simple to get a reading. Extreme ultraviolet (EUV) lithography remains delayed. The other next-generation l... » read more

EUV Reaches A Crossroads
By Mark LaPedus - 20 Mar, 2014 - Comments: 3

[gettech id="31045" comment="EUV"] (EUV) [getkc id="80" comment="lithography"] is at a crossroads. 2014 represents a critical year for the technology. In fact, it may answer a pressing question about EUV: Does it work or not? It’s too early to make that determination right now, but there are more uncertainties than ever for the oft-delayed technology. Originally aimed for the 65nm node in... » read more

One-on-One: Naoya Hayashi
By Mark LaPedus - 20 Mar, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss the current and future challenges in the photomask industry with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP). SE: What are the big challenges for the photomask industry today? Hayashi: There are several challenges. Most of the challenges involve mask complexity. It is also quite difficult to handle the mask data, because it is ... » read more

Advanced Lithography: Moore’s Law Moves On
By Marc David Levenson - 20 Mar, 2014 - Comments: 1

Every February, experts in nano patterning technologies converge in San Jose, Calif., to present their road maps, brainstorms and results at the SPIE Advanced Lithography Symposium. This year, there was more confusion than ever, partly the result of sessions in unlabeled (but beautiful) new ballrooms at the Convention Center, but mostly because of industry divergences. There is no longer a s... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 14 Mar, 2014 - Comments: 0

SanDisk filed a civil suit against Korea’s SK Hynix. Additionally, SanDisk has submitted a criminal complaint with the Tokyo Metropolitan Police Department against a former employee. These actions relate to the theft of trade secrets related to NAND flash technology by a former engineer of SanDisk who left the company in 2008 to work for SK Hynix. Cadence Design Systems and GlobalFoundrie... » read more

The Final Deadline For EUV
By Ed Sperling - 27 Feb, 2014 - Comments: 5

When TSMC disclosed this week—in a public forum—that its production EUV lithography test had failed in one of the early test runs due to a power source issue, there were very different reactions. EUV, after all, is an emotional issue with billions of dollars invested and lots of jobs riding on this technology. To begin with, there has been the usual spin control. The message essentially ... » read more

Time to mend the EE / CS divide
By Kurt Shuler - 27 Feb, 2014 - Comments: 0

There’s been a lot of news out the last few weeks about the future of our industry, and although these news flashes may seem unrelated, they are quite correlated. First, there was the disturbing news in Mark LaPedus’ article here on Semiconductor Engineering, “EUV Suffers New Setback,” portending a rough ride for the commercialization of EUV lithography. EUV will be needed to create ... » read more

EUV Suffers New Setback
By Mark LaPedus - 24 Feb, 2014 - Comments: 8

ASML Holding’s initial, production-worthy extreme ultraviolet (EUV) lithography tool has suffered a setback during a recent trial run at Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC). TSMC disclosed the problem during a public presentation at the 2014 Advanced Lithography conference in San Jose, Calif. During the trial run at TSMC, the EUV source crashed due to a misalignment of the l... » read more

← Older posts Newer posts →

  • Sponsors

  • Standards/Organizations

About

Navigation

Connect With Us

Copyright ©2013-2026 SMG   |  Terms of Service  |  Privacy Policy