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Improving EUV Underlayer Coating Defectivity Using Point-Of-Use Filtration

Efforts to understand their impact on EUV underlayer coating defects.

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Authors: Aiwen Wu (Entegris, Inc. — United States), Hareen Bayana (Entegris GmbH — Germany), Philippe Foubert (imec — Belgium), Andrea Chacko and Douglas Guererro (Brewer Science, Inc. — United States).

This paper describes efforts to leverage different filtration parameters, including retention ratings and membrane materials, to understand their impact on EUV underlayer coating defects, and will present the characterization of coating defects in very thin films.

Click here to learn more about this article — Society of Photo-Optical Instrumentation Engineers (SPIE).



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