Mask Data Prep Issues Compounding At 20nm


By Ann Steffora Mutschler When it comes to mask data prep—the step in the design and manufacturing flow that occurs just after optical proximity correction (OPC)—challenges have continued to rise with the subsequent moves to smaller geometries. This is driven by the scaling demands of delivering about a 50% area shrink from node to node on a two-year cycle, and thus dictates the lithog... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What is the general state of the next-genera... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. (Part one can be found here.) SMD: Let’s re-vi... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What are the big challenges in lithography?... » read more

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