tag: Hitachi

The Week In Review: July 22
By Mark LaPedus - 22 Jul, 2013 - Comments: 0

By Mark LaPedus ASML Holding has been under pressure to bring extreme ultraviolet (EUV) lithography into mass production. EUV is still delayed. Now, in their latest roadmaps, leading-edge chipmakers are counting on ASML’s 300mm EUV scanner for insertion at the 10nm node. Yet, at the same time, ASML also is working on a 450mm version of the EUV tool. “EUV (on 300mm) is a higher priority th... » read more

The Week In Review: July 19
By Ed Sperling - 19 Jul, 2013 - Comments: 0

By Ed Sperling Synopsys rolled out a 28nm data converter IP portfolio for analog-to-digital and digital-to-analog converters, as well as integrated PLLs. Synopsys says the new architecture saves up to 76% of the power and 86% of area. Mentor Graphics added intelligent software-driven verification to its functional verification platform. New is the ability to automatically generate embedded ... » read more

Wanted: New Metrology Funding Models
By Mark LaPedus - 21 Mar, 2013 - Comments: 0

By Mark LaPedus The shift toward the 20nm node and beyond will require new and major breakthroughs in chip manufacturing. Most of the attention centers around lithography, gate stacks, interconnects, strain engineering and design-for-manufacturing (DFM). Lost in the conversation are two other critical but overlooked pieces in the manufacturing puzzle—wafer inspection and metrology. ... » read more

Swimming In Data
By Ed Sperling - 21 Mar, 2013 - Comments: 0

By Ed Sperling So many warnings about data overload have been issued over the past decade that people generally have stopped paying attention to them. The numbers are so astronomical that increases tend to lose meaning. Nowhere is this more evident than in the semiconductor metrology world, where files are measured in gigabytes. And at each new process node, as the number of transistors a... » read more

DSA: High Stakes Game Of Alphabet Soup
By Ed Sperling - 20 Sep, 2012 - Comments: 0

By Mark LaPedus Directed self-assembly (DSA) is making progress for potential use in semiconductor production, but the industry must make some major advances in a sometimes forgotten and unsung segment—materials. DSA is a complementary patterning technology that makes use of block copolymer materials to enable fine pitches in chip designs. But today’s block copolymers based on poly (MMA... » read more

Gene’s Law Meets EDA
By Ed Sperling - 17 Mar, 2011 - Comments: 0

By Pallab Chatterjee What will be the next major improvement that will cut power levels by an order of magnitude? That question was the basis of a roundtable discussion at the recent ISSC conference. Current technology provides incremental improvements each year, but the next generation of electronic systems will require dramatic changes and innovation. This premise is based on Gene’s Law... » read more

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