tag: lithography

There’s More To EUV Than Source Power
By Katherine Derbyshire - 20 Sep, 2012 - Comments: 0

By Katherine Derbyshire For some time now, most industry coverage of EUV lithography has focused on the light source. As my colleagues have pointed out, source power limitations impose major constraints on not only potential EUV-based device manufacturing, but even on development of sub-20nm devices and process technologies. When throughput is in the neighborhood of four wafers per hour, lear... » read more

Inflection Points Ahead
By Ed Sperling - 23 Aug, 2012 - Comments: 0

By Ed Sperling Engineering challenges have existed at every process node in semiconductor designs, but at 20nm and beyond, engineers and executives on all sides of the industry are talking about inflection points. An inflection point is literally the place where a curve on a graph turns down or up, but in the semiconductor industry it’s usually associated with the point at which a progres... » read more

Why the Big Players Like 450mm Wafers
By Chris Mack - 20 Aug, 2012 - Comments: 0

The reason semiconductor manufacturers like the idea of 450-mm wafers is easy to understand:  bigger wafers should lower the per-chip cost of manufacturing.  But as I mentioned in my last post, this per-chip cost advantage doesn’t apply to lithography.  Each time a wafer size is increased, only the non-litho (per-chip) costs go down, and so lithography costs take up a bigger portion of the... » read more

Experts At The Table: Challenges At 20nm
By Ed Sperling - 17 Aug, 2012 - Comments: 0

By Ed Sperling Low-Power/High-Performance Engineering sat down to discuss the challenges at 20nm and beyond with Jean-Pierre Geronimi, special projects director at STMicroelectronics; Pete McCrorie, director of product marketing for silicon realization at Cadence; Carey Robertson, director of product marketing at Mentor Graphics; and Isadore Katz, president and CEO of CLK Design Automation. Wh... » read more

Experts At The Table: Challenges At 20nm
By Ed Sperling - 17 Aug, 2012 - Comments: 0

By Ed Sperling Low-Power/High-Performance Engineering sat down to discuss the challenges at 20nm and beyond with Jean-Pierre Geronimi, special projects director at STMicroelectronics; Pete McCrorie, director of product marketing for silicon realization at Cadence; Carey Robertson, director of product marketing at Mentor Graphics; and Isadore Katz, president and CEO of CLK Design Automation. Wh... » read more

Ivy Bridge Settles Old Bet
By Marc David Levenson - 16 Aug, 2012 - Comments: 0

Think back seven years to 2005. Those were boom times with the housing market rising, the dollar high, 65nm node chips on the horizon and EUV the great future lithography hope. EUVL was late for the next (45nm) node, but a great new idea had appeared to fill the gap—water immersion scanning with 193nm exposure! But how far could wet 193nm lithography go before EUVL or some new thing, such as ... » read more

Revisiting Moore’s Law
By Ed Sperling - 09 Aug, 2012 - Comments: 0

Moore’s Law was predicted to end at 1 micron. It was predicted to die off twice by Gordon Moore himself. And it has vacillated between 18 and 24 months on at least a couple of occasions since it was first introduced in 1965. From a technology perspective, there is no reason to assume it will ever die. It has gone from microns to nanometers and it can continue well into the picometer range.... » read more

Why 450mm wafers?
By Chris Mack - 08 Aug, 2012 - Comments: 1

Why is 450-mm development so important to Intel (and Samsung and TSMC)? A few years ago, Intel and TSMC began heavily promoting the need for a transition from the current standard silicon wafer size, 300 mm, to the new 450-mm wafers.  While many have worked on 450-mm standards and technology for years, it is only recently that the larger wafer has received enough attention and support (not ... » read more

DSA Moves To R&D Pilot Lines
By Ed Sperling - 31 Jul, 2012 - Comments: 0

By Mark LaPedus Directed self-assembly (DSA), an alternative lithography technology that makes use of block copolymers, is still in the R&D stage for semiconductor production. But as the exotic patterning technology continues to make astounding progress, there are signs the IC industry is accelerating its efforts to bring DSA from the lab to the fab. In fact, DSA suddenly has become a ... » read more

Future Foundry Issues
By Ed Sperling - 13 Jul, 2012 - Comments: 0

Semiconductor Manufacturing & Design talks with Luigi Capodieci, fellow at GlobalFoundries, about EUV, the challenges at 20nm and beyond, and the future of the foundry model. [youtube vid=YXov4y0kpfU] » read more

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