Fixing DP Errors: Colors Or Rings


By Ann Steffora Mutschler With the move to the 20nm manufacturing node, double patterning (DP) became a requirement. In addition, topology changes occurred that demanded very regular structures, marking a significant departure from 28nm design. As a result of this new approach, new errors are popping up, such as DP violation loops, odd cycle violations and anchor path violations. Certain... » read more

Verifying Your Intent


Design rule checking (DRC), layout versus schematic (LVS) and electrical rule checking (ERC) are physical verification techniques that are mandatory today to check a design and its structures before manufacturing. Checking electrical characteristics of a design is one thing. Verifying power intent is quite another. And the overlap of the two is an intriguing concept. Case in point: Checking fo... » read more

Newer posts →