Chip Industry Week in Review


Amkor, TSMC, and Cadence partnered with Tesoro VC, which will serve as the lead operator of a new Global AI + Semiconductor Startup Hub and a Global Design Center in Phoenix, Arizona, aimed at chip innovation, startup growth, and advanced manufacturing. Nvidia will invest $5 billion in Intel common stock at a purchase price of $23.28 per share and the companies will collaborate on AI infrastru... » read more

Metrology Under Pressure: Detecting Defects in Fine-Pitch Hybrid Bonding


As advanced packaging pushes deeper into the sub-10µm realm, traditional inspection and metrology systems are being forced to evolve with it. Hybrid bonding, a critical enabler of vertical integration and 3D system performance, relies on exceptionally tight alignment and defect-free bonding surfaces. But as interconnect pitch shrinks, even nanometer-scale variations in height, tilt, or cont... » read more

Chip Industry Week in Review


The U.S. government announced new import tariff actions and deals this week, including: The EU: 15% tariff on most goods including semiconductors. According to the EU's president, the action excludes semiconductor equipment. Copper: 50% tariff on all imports of semi-finished copper products and intensive copper derivative products, effective Aug. 1, but raw input material is excluded. ... » read more

Disruptive Changes Ahead For Photomasks?


Experts at the Table: Semiconductor Engineering sat down with four experts to explore the current state and future direction of mask-making, with insights from Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics. What follows ... » read more

Variable Bias Completes The PLDC Model And Offers Superior MPC Results


This is the third in a three-blog series on PLDC. The first installment was “Improving Uniformity and Linearity for All Masks,” from January 29, 2025. The second blog was “Three Ways Curvy ILT Together with PLDC Improves Wafer Uniformity,” from April 18, 2025. In 2024, the eBeam Initiative Luminaries Survey found that the number one concern in adoption of curvilinear mask features wa... » read more

Photomask Changes And Challenges At Mature And Advanced Nodes


Experts at the Table: Semiconductor Engineering sat down to discuss the current state and future direction of mask-making, with Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics. What follows are excerpts of that conversation.... » read more

Chip Industry Week in Review


The Chinese Academy of Sciences unveiled a fully automated processor chip design system, claiming the potential to accelerate semiconductor development and replace human programmers. Micron Technology plans to expand its U.S. investments to approximately $150 billion in domestic memory manufacturing and $50 billion in R&D, which is $30 billion higher than previously reported. AMD laun... » read more

Automotive Outlook 2025: Ecosystem Pivots Around SDV


The automotive industry is deep in the throes of a massive shift to software-defined vehicle architectures, a multi-year effort that will change the way automotive chips are designed, where they are used, and how they are sourced. Creating a new vehicle architecture is no small feat. OEMs need to figure out who to partner with and which aspects of their current architecture to include. This ... » read more

Chip Industry Week In Review


Global semiconductor sales hit $57.8 billion in November 2024, an increase of 20.7% compared to the same month last year, according to the Semiconductor Industry Association. In U.S. government news: The U.S. Department of Commerce finalized up to $325 million in CHIPS Act funding for Hemlock Semiconductor, which will support construction of a new semiconductor-grade polysilicon manufac... » read more

Chip Industry Week in Review


Lawrence Livermore National Laboratory is ramping up R&D for next-gen EUV and plasma-based particle sources, aiming to increase the EUV laser source power by an order of magnitude while also making it more energy-efficient. Specifically, the goal is to replace today's CO2-based laser with a solid-state laser, using a thulium-doped yttrium lithium fluoride medium to increase the laser's powe... » read more

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