中文 English

Highly Sensitive Focus Monitoring Technique Based On Illumination And Target Co-Optimization


By Myungjun Lee, Mark D. Smith, Pradeep Subrahmanyan, and Ady Levy. Abstract We present a cost-effective focus monitoring technique based on the illumination and the target co-optimization. An advanced immersion scanner can provide the freeform illumination that enables the use of any kind of custom source shape by using a programmable array of thousands of individually adjustable micro-mi... » read more

Good Pattern Flow Ahead For 14, 10nm


By Ann Steffora Mutschler Given complexity, yield, power and other challenges with leading edge manufacturing, semiconductor foundries increasingly have been forced to require more and more restrictive design rules with each new process node. “They keep adding more design rules and more operations to a particular check to eliminate corner cases where in manufacturing they saw some variant... » read more