tag: scatterometry

Challenges Mount In Inspection And Metrology
By Mark LaPedus - 12 Dec, 2013 - Comments: 0

Chipmakers are moving full speed ahead toward smaller process nodes, thereby driving up the costs and complexities in chip manufacturing. The migrations also are putting enormous stress on nearly all points of the fab flow, including a critical but unsung part of the business—process control. Process control involves 20 or so different segments in the inspection and metrology arena. Genera... » read more

Waiting For 3D Metrology
By Mark LaPedus - 18 Apr, 2013 - Comments: 0

By Mark LaPedus Over the years, suppliers of metrology equipment have managed to meet the requirements for conventional planar chips. But tool vendors now find themselves behind in the emerging 3D chip era, prompting the urgent need for a new class of 3D metrology gear. 3D is a catch-all phrase that includes a range of new architectures, such as finFET transistors, 3D NAND and stacked-die ... » read more

Wanted: New Metrology Funding Models
By Mark LaPedus - 21 Mar, 2013 - Comments: 0

By Mark LaPedus The shift toward the 20nm node and beyond will require new and major breakthroughs in chip manufacturing. Most of the attention centers around lithography, gate stacks, interconnects, strain engineering and design-for-manufacturing (DFM). Lost in the conversation are two other critical but overlooked pieces in the manufacturing puzzle—wafer inspection and metrology. ... » read more

Swimming In Data
By Ed Sperling - 21 Mar, 2013 - Comments: 0

By Ed Sperling So many warnings about data overload have been issued over the past decade that people generally have stopped paying attention to them. The numbers are so astronomical that increases tend to lose meaning. Nowhere is this more evident than in the semiconductor metrology world, where files are measured in gigabytes. And at each new process node, as the number of transistors a... » read more

More Photons Are Good
By Michael Watts - 20 Mar, 2013 - Comments: 0

By Michael P.C. Watts Scatterometry is the favored approach to monitor complex 3D nano-structures in production. At SPIE Advanced Lithography, KLA introduced a new generation of their scatterometry metrology system. The new system expands the number of different measurements; know internally as multi-multi-multi. Scatterometry relies on measuring the diffraction patterns from a test diffr... » read more

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