New Interconnect Materials Beyond Copper (Florida State Univ., Cornell)


A new technical paper titled "Shrinking interconnects beyond copper" was published by researchers at Florida State University and Cornell University. Excerpt "The continuous downscaling of transistors in integrated circuits following Moore’s law—doubling the number of transistors on a microchip about every 2 years—has been an extraordinary feat of engineering, pushing the limits of fu... » read more

Integration Of Layered Semimetals With Conventional CMOS Platform


A technical paper titled “Layered semimetal electrodes for future heterogeneous electronics” was published by researchers at IIT Madras and Indian Institute of Science Education and Research. Abstract: "Integration of the emerging layered materials with the existing CMOS platform is a promising solution to enhance the performance and functionalities of the future CMOS based integrated cir... » read more

New Materials Open Door To New Devices


Integrating 2D materials into conventional semiconductor manufacturing processes may be one of the more radical changes in the chip industry’s history. While there is pain and suffering associated with the introduction of any new materials in semiconductor manufacturing, transition metal dichalcogenides (TMDs) support a variety of new device concepts, including BEOL transistors and single-... » read more