tag: lithography

Inflection Points And Changes Ahead
By Ed Sperling - 23 Feb, 2013 - Comments: 0

It’s hard to justify throwing away a well-oiled machine and replacing it with a new one. It works, it’s predictable and it’s low risk. And nowhere is this more evident than in the semiconductor industry. The doubling of transistors every two years for nearly five decades has created a $300 billion chip industry, reduced the price of processing by orders of magnitude, and made possible ele... » read more

Optical Lithography, Take Two
By Mark LaPedus - 21 Feb, 2013 - Comments: 0

By Mark LaPedus It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter stages of 10nm or by 7nm, but vendors are not counting on EUV in the near term and are preparing their back-up plans. Barring a breakthrough with EUV or other technology, IC ... » read more

A Call To Action: How 20nm Will Change IC Design
By Various Writers - 21 Feb, 2013 - Comments: 0

The 20nm process node represents a turning point for the electronics industry. While it brings tremendous power, performance and area advantages, it also comes with new challenges in such areas as lithography, variability, and complexity. The good news is that these become manageable challenges with 20nm-aware EDA tools when they are used within end-to-end, integrated design flows based on a �... » read more

Uncommon Goals
By Atrenta - 14 Feb, 2013 - Comments: 0

I had the opportunity to attend the Common Platform event recently. This is a technology and business showcase sponsored by Global Foundries, IBM and Samsung with major support from ARM, Cadence, Synopsys and Mentor. Wow, that’s some serious sponsorship. The event was well run and provided a good balance of technology details and business outlook. The wine at the evening reception was decent ... » read more

Tech Talk: Getting To The Next Node
By Ed Sperling - 14 Feb, 2013 - Comments: 0

IBM's Gary Patton talks with Low-Power/High-Performance Engineering about finFETs, EUV, and the challenges of staying on the Moore's Law road map. [youtube vid=jtz9XSXyBp0] » read more

Increasing Levels Of Risk
By Ed Sperling - 13 Dec, 2012 - Comments: 0

Semiconductor Manufacturing & Design sits down with Mentor Graphics' Jean-Marie Brunet to talk about double patterning, finFETs, design rules at advanced nodes and why design for manufacturing (DFM) has suddenly become so popular. [youtube vid=3GHvikyjZow] » read more

Why Do My DP Colors Keep Changing?
By David Abercrombie - 15 Nov, 2012 - Comments: 0

By David Abercrombie At 20nm, foundries are using several different double patterning design flows. One of the more common flows does not actually require the design team to decompose their layers into two colors. The designer only has to verify that the design can be decomposed before taping out each single layer. There are certain obvious advantages to this flow. For example, the designer do... » read more

Experts At The Table: Issues In Lithography
By Ed Sperling - 29 Oct, 2012 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. (Part one can be found here.) SMD: Let’s re-vi... » read more

Experts At The Table: Issues In Lithography
By Ed Sperling - 18 Oct, 2012 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What are the big challenges in lithography?... » read more

ASML to Buy Cymer
By Chris Mack - 17 Oct, 2012 - Comments: 0

"We have experienced some delay in EUV, basically caused by delays in developing the light source", said Peter Wennink, ASML's financial chief. With that understatement, ASML succinctly explained its rationale for offering $2.6B in cash (25%) and stock (75%) to buy San Diego-based Cymer, the leading developer of EUV sources.  Over the last year, ASML has sent about 500 of their engineers to... » read more

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