Blog Review: Jun. 3


Siemens' Gordon Allan contends that verification IP gives design teams a practical way to verify standards-based interfaces and memories without rebuilding the same infrastructure generation after generation and shares key evaluation metrics. Synopsys' Sutirtha Kabir suggests that successful multi-die design will require deeper collaboration from early architecture exploration to manufacturi... » read more

1 Megawatt Racks In Data Centers


The demand for performance in an AI data center is causing a huge spike in the amount of power being consumed. Within a rack are a half-dozen SoC components housed in different types of advanced packages and connected with an assortment of blazing-fast interface IP and optical signaling. Manmeet Walia, director of product management for mixed-signal PHY IP in the Synopsys Solutions Group, talks... » read more

Beating the Edge AI Power Wall with Low Voltage Foundation IP


Edge AI is pushing the limits of power efficiency as intelligence moves closer to the data source. Designing for ultra-low voltage operation is now essential to achieve optimal performance-per-watt—but it introduces significant complexity in modeling, variation, and design predictability. In this white paper, discover how a unified, silicon-proven Foundation IP platform approach enables relia... » read more

The Sub-2nm Paradox


Key Takeaways: Process variation and physics are changing semiconductor design, manufacturing, and economics at 2nm and below. Even though new manufacturing processes are being introduced, it's taking longer for them to mature. The focus for many chip designs is faster data movement and more efficient computing, rather than just relying on more transistors per mm2. At 2nm an... » read more

Chip Industry Week In Review


ECTC Panel-level packaging, hybrid bonding, new substrates, and fine-pitch interconnects topped the list of advanced packaging technologies at ECTC this week. Among the announcements: ASE launched an automated 310mm × 310mm panel-level packaging production line. Expected to enter production in the first half of 2027, the line is compatible with FOCoS and FOCoS-Bridge pa... » read more

Swapping Out Chiplets: I/Os Vs. Compute


Key Takeaways: Companies can save time and money by swapping out a compute, memory, or I/O chiplet to gain technology improvements, while keeping the other dies stable. Chip architects may choose to keep their I/Os stable and swap out compute to move from a 5nm process node to 3nm to achieve performance and power improvements, or swap out memory from LPDDR5X to LPDDR6. Swapping out... » read more

Toward Agentic Verification


Key Takeaways: Agentic verification provides flow orchestration for common repetitive tasks. Capabilities will expand when tools can learn from a larger context, including the specification. Design houses need to fully understand the costs and benefits and plan accordingly. Agentic verification is more than a buzzword. It is a pivotal moment in the evolution of verification ... » read more

Observability Is Essential For Modern Silicon


Experts At The Table: In-silicon observability — also known as on-die or on-chip visibility — is becoming increasingly important for managing the performance, reliability, and security of today’s high-performance systems. Semiconductor Engineering sat down to discuss this with Andy Nightingale, vice president of product management and marketing at Arteris; Nandan Nayampally, chief commerc... » read more

Faster Verification Debug With AI


Every stage of semiconductor development takes longer and requires more effort with each new generation of chips. At no stage is this more apparent than functional verification. Industry consensus is that verification consumes roughly two-thirds of development time and resources. Within verification, debug is the most challenging step, consuming a third to two-thirds of the effort. Any serious ... » read more

Curvilinear Masks Push The Limits Of Inspection And Metrology


Key Takeaways: Curvilinear masks require native data flows across design, mask data prep, writing, inspection, and metrology. Inspection is shifting from finding all defects to identifying which mask variations actually print on wafer. High-NA EUV will intensify inspection challenges, particularly for small printable defects and actinic contrast limits. Experts at the table... » read more

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