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EUV Reaches A Crossroads


[gettech id="31045" comment="EUV"] (EUV) [getkc id="80" comment="lithography"] is at a crossroads. 2014 represents a critical year for the technology. In fact, it may answer a pressing question about EUV: Does it work or not? It’s too early to make that determination right now, but there are more uncertainties than ever for the oft-delayed technology. Originally aimed for the 65nm node in... » read more

Week In Review: Manufacturing, Design, Test


Reports have surfaced that IBM’s semiconductor unit is on the block, and there has been discussion about the reasons and the aftermath. Sources say there are at least two potential buyers for the unit—Samsung and TowerJazz. Apparently, the talks between IBM-Samsung and IBM-TowerJazz have been going on for some time. Multiple sources believe that Samsung is interested in buying IBM’s advan... » read more

Keeping EUV Cool


It’s been clear for a long time that EUV lithography sources will be fairly inefficient. The laser-produced plasma (LPP) source concept involves heating a droplet of metallic tin with a high-powered laser to produce a plasma. Only a fraction of the energy of the laser will be converted to light, rather than heat, and less than 1% of the light emitted by the plasma will be at EUV wavelengths. ... » read more

Reaching For The Reset Button In Lithography


By Mark LaPedus Amid ongoing delays and setbacks, extreme ultraviolet (EUV) lithography and multi-beam e-beam have both missed the 10nm logic node. So for the present, chipmakers must take the brute force route at 10nm by using 193nm immersion with multiple patterning. Now, it’s time to hit the reset button. For the 7nm node, chipmakers currently are lining up the lithographic competition... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What is the general state of the next-genera... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. (Part one can be found here.) SMD: Let’s re-vi... » read more

Experts At The Table: Issues In Lithography


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Juan Rey, senior director of engineering at Mentor Graphics; Aki Fujimura, chairman and chief executive at D2S; and Tatsuo Enami, general manager for the sales division at Gigaphoton. What follows are excerpts of that conversation. SMD: What are the big challenges in lithography?... » read more

Laser pulses illuminate downturn and recovery


[caption id="attachment_7313" align="alignnone" width="728"] Laser pulses per month for Gigaphoton's KrF and ArF lasers[/caption] I thought this image was a nice illustration of exactly what happened in the most recent industry downturn. The graphic shows the number of pulses per laser, per month, for Gigaphoton's installed base of ArF and KrF lasers. A stepper processing 1,000 wafers per mo... » read more

EUV Focus Shifts To Affordability


By David Lammers Over the past year, key technologists in the semiconductor industry have come around to believing that EUV lithography will be available for critical mask layers in the next three to five years. What is still up for debate is whether EUV will be cost-effective for low-power consumer SoCs. To penetrate that cost-sensitive market, EUV must overcoming hurdles presented by masks, ... » read more

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