Experts At The Table: Issues In Metrology And Inspection


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future metrology and inspection challenges with John Allgair, senior member of the technical staff at GlobalFoundries; Kevin Heidrich, vice president of marketing and business development at Nanometrics; Robert Newcomb, executive vice president at Qcept Technologies; and Shrinivas Shetty, vice president of marketing f... » read more

Design-For-DSA Industry Begins To Assemble


By Mark LaPedus The industry is aggressively pursuing directed self-assembly (DSA) as an alternative patterning technology for future chip designs. DSA, which enables fine pitches through the use of block copolymers, is in the R&D pilot line stage today. The fab tools, process flows and materials are basically ready, but there are still several challenges to bring the technology from th... » read more

Foundry Models In Transition


By Jeff Chappell There may have been a time when AMD founder Jerry Sanders famous quote: "real men (i.e., real companies) have their own fabs” rang true, but in today's business climate it seems quaint at best. Fabless or fab-lite business models are more popular than ever today, while some IDMs have turned back the clock, so to speak, looking to improve capacity utilization and revenues ... » read more

Waiting For 3D Metrology


By Mark LaPedus Over the years, suppliers of metrology equipment have managed to meet the requirements for conventional planar chips. But tool vendors now find themselves behind in the emerging 3D chip era, prompting the urgent need for a new class of 3D metrology gear. 3D is a catch-all phrase that includes a range of new architectures, such as finFET transistors, 3D NAND and stacked-die ... » read more

Experts At The Table: Issues In Metrology And Inspection


By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future metrology and inspection challenges with John Allgair, senior member of the technical staff at GlobalFoundries; Kevin Heidrich, vice president of marketing and business development at Nanometrics; Robert Newcomb, executive vice president at Qcept Technologies; and Shrinivas Shetty, vice president of marketing f... » read more

MEMS Explosion


By Rakesh Kumar The MEMS market is set to explode. By 2017 the market is expected to be worth $12.2 billion, a 50% increase from 2011, according to IHS iSuppli. Driving this growth will be the continued usage of MEMs devices for consumer applications, such as smartphones, tablets, gaming consoles and cameras. Additionally, new products such as silicon timing devices, tunable capacitors for ant... » read more

GF’S Two Flavors Of FD-SOI


Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~  ~ Hearing the news that GlobalFoundries would be offering two flavors of FD-SOI, ASN asked the company to explain the strategy further. Here are the responses provided by Subi Kengeri, Vice President of Advanced Technology Architecture.   [caption id="" align="alignleft" width="110"] Subi Kengeri, VP Advanced T... » read more

Uncertainty Ahead


If finFETs work as planned, it’s likely they will show up in every complex SoC for decades to come. Adding another dimension to transistors has enormous potential at advanced nodes, and maybe even at older nodes. 3D transistors also could be part of stacked die, and they can be combined with fully depleted SOI—two other options for reducing power. Moreover, it’s likely that whatever G... » read more

Wanted: New Metrology Funding Models


By Mark LaPedus The shift toward the 20nm node and beyond will require new and major breakthroughs in chip manufacturing. Most of the attention centers around lithography, gate stacks, interconnects, strain engineering and design-for-manufacturing (DFM). Lost in the conversation are two other critical but overlooked pieces in the manufacturing puzzle—wafer inspection and metrology. ... » read more

Reaching For The Reset Button In Lithography


By Mark LaPedus Amid ongoing delays and setbacks, extreme ultraviolet (EUV) lithography and multi-beam e-beam have both missed the 10nm logic node. So for the present, chipmakers must take the brute force route at 10nm by using 193nm immersion with multiple patterning. Now, it’s time to hit the reset button. For the 7nm node, chipmakers currently are lining up the lithographic competition... » read more

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