Research Bits: Jan. 20


ALD for Ru wiring Researchers from Ulsan National Institute of Science and Technology (UNIST), Hongik University, and Tanaka Precious Metal Technologies developed an atomic layer deposition (ALD) process for creating chip interconnects using a ruthenium (Ru) precursor with a thermal stability up to 400 °C. The high-temperature ALD process can produce dense, high-quality Ru films without deg... » read more

Chip Industry’s Technical Paper Roundup: Dec. 20


New technical papers added to Semiconductor Engineering’s library this week. [table id=71 /] If you have research papers you are trying to promote, we will review them to see if they are a good fit for our global audience. At a minimum, papers need to be well researched and documented, relevant to the semiconductor ecosystem, and free of marketing bias. There is no cost involved for us po... » read more

All-Digital MDL-Based Fast Lock Clock Generator For Low-Power Chiplet-Based SoC Design


A new technical paper titled "A Fast-Lock All-Digital Clock Generator for Energy Efficient Chiplet-Based Systems" was published by researchers at Hongik University, Seoul, South Korea. "An all-digital clock frequency multiplier that achieves excellent locking time for an energy-efficient chiplet-based system-on-chip (SoC) design is presented. The proposed architecture is based on an all-digi... » read more

Power/Performance Bits: Aug. 18


Flexible, hole-filled films Researchers from Daegu Gyeongbuk Institute of Science and Technology (DGIST) and Hongik University propose a simple way to make flexible electrodes and thin film transistors last longer: adding lots of tiny holes. A major problem with flexible electronics is the formation of microscopic cracks after repeated bending which can cause the device to lose its conducti... » read more