Blog Review: March 22


Cadence's Paul McLellan shares TSMC's plans for 5nm and gate-all-around FET, plus other highlights from last week's Technology Symposium. Mentor's Craig Armenti examines how product development teams can increase efficiency through concurrent schematic design. Synopsys' Jim Ivers warns of the data security and privacy issues posed by a wave of popular connected toys. At Embedded World,... » read more

Patterning Problems Pile Up


Chipmakers are ramping up 16nm/14nm finFET processes, with 10nm and 7nm now moving into early production. But at 10nm and beyond, chipmakers are running into a new set of problems. While shrinking feature sizes of a device down to 10nm, 7nm, 5nm and perhaps beyond is possible using current and future fab equipment, there doesn't seem to be a simple way to solve the edge placement error (EPE)... » read more

The Week In Review: Manufacturing


Chipmakers At this week’s TSMC Technology Symposium in San Jose, Calif., TSMC rolled out a dizzying array of new processes and technologies. Perhaps the most surprising announcement was a 22nm bulk CMOS process, which is geared for ultra low-power planar chips. The technology will compete against a 22nm FD-SOI technology from GlobalFoundries. Stay tuned. The battle has just begun. As e... » read more

Inside Lithography And Masks


Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; David Fried, chief technology officer at [getentity id="22210" e_name="Cove... » read more

MEMS Microphones: A Bright Spot Among Commoditized Consumer Sensors


MEMS microphones have emerged as a bright spot among consumer sensors, which in general are going through a rapid commoditization and profit-squeezing trend. To understand what’s driving the MEMS microphone market, consider that the Apple iPhone 7 and 7S each have 4 MEMS microphones. As reported by System Plus Consulting, the latest iPhones have “a front-facing top microphone, presumably f... » read more

China: Fab Boom or Bust?


China’s semiconductor industry continues to expand at a frenetic pace. At present there are nearly two dozen new fab projects in China. Whether all these fab projects get off the ground is not entirely clear because the dynamics in China remain fluid. What is clear is the motivation behind this building frenzy—China is trying to reduce its huge trade imbalance in ICs. The country continu... » read more

Blog Review: March 15


Cadence's Christen Decoin looks back at the changes in design rule checking and asks, with growing design sizes and rule complexity, has DRC run out of steam? Synopsys' Eric Huang provides some background on DisplayPort and its integration with the USB Type-C connector. In his latest video, Mentor's Colin Walls investigates the relationship between the choice of operating system and the p... » read more

MEMS: Improving Cost And Yield


MEMS devices inspire awe on the design side. On the test and manufacturing side, they evoke a different kind of reaction. These are, after all, the intersection of mechanical and electrical engineering—a joining of two miniature worlds that are the basis of some of the most complex technology on the planet. But getting these devices to yield sufficiently, understanding what does or does no... » read more

The Week In Review: Manufacturing


Fab tools In response to SEMI members and partners, SEMI says it is not organizing Semicon Russia 2017, or any other events in Russia this year. “In light of the current market conditions and SEMI stakeholder concerns, SEMI reached out to members and customers over the last six months to assess how to provide the most value for our community in Russia,” said Laith Altimime, president of SE... » read more

The Week In Review: Manufacturing


SPIE news At this week’s SPIE Advanced Lithography conference, the industry paid close attention to the progress of extreme ultraviolet (EUV) lithography. Here’s the general report card: EUV is making noticeable progress, but there are still some challenges ahead, such as the power source, resists and pellicles. Several issues need to be resolved before chipmakers can put EUV into mass... » read more

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