tag: lithography

Mask Supply Chain Preps For 10nm
By Dylan McGrath - 17 Sep, 2015 - Comments: 0

As the semiconductor industry gears up for the 10nm logic node—now likely to begin in the second half of 2017—the photomask supply chain is preparing to grapple with the associated challenges, including dramatic increases in photomask complexity, write times and data volumes. The 10nm node will require more photomasks per mask set, the ability to print smaller and more complex features, ... » read more

EUV: Cost Killer Or Savior?
By Katherine Derbyshire - 17 Sep, 2015 - Comments: 4

Moore’s Law, the economic foundation of the semiconductor industry, states that transistor density doubles in each technology generation, at constant cost. As IMEC’s Arindam Mallik explained, however, the transition to a new technology node is not a single event, but a process. Typically, when the new technology is first introduced, it brings a 20% to 25% wafer cost increase. Process opt... » read more

Memory Hierarchy Shakeup
By Mark LaPedus - 16 Sep, 2015 - Comments: 0

It’s no secret that today’s memory chips and storage devices are struggling to keep up with the growing demands in data processing. To solve the problem, chipmakers have been working on several next-generation memory types. But most technologies have been delayed or fallen short of their promises. But after numerous delays, a new wave of next-generation, nonvolatile memories are finally ... » read more

How Long Will FinFETs Last?
By Ann Mutschler - 13 Aug, 2015 - Comments: 0

Semiconductor Engineering sat down to discuss how long FinFETs will last and where we will we go next with Vassilios Gerousis, Distinguished Engineer at [getentity id="22032" e_name="Cadence"]; Juan Rey, Sr. Director of Engineering for Calibre R&D at [getentity id="22017" e_name="Mentor Graphics"]; Kelvin Low, Senior Director Foundry Marketing at [getentity id="22865" e_name="Samsung"]; and Vic... » read more

Why DSA Is Cost Effective For 7nm And Below
By Yuansheng Ma - 30 Jul, 2015 - Comments: 0

The upcoming 7nm process node presents tough challenges both for printability and cost. At 7nm and below, multi-patterning is required, which makes the manufacturing process more expensive by requiring more masks. To control costs, any alternative technology that provides equivalent yields with fewer patterning steps should be explored. One promising option is to use directed self-assembly (... » read more

The Great Imbalance
By Ed Sperling - 23 Jul, 2015 - Comments: 2

The number of options for chipmakers is growing while the number of chipmakers is shrinking. So what does this mean for the semiconductor industry? Short answer: No one is quite sure yet. But a lot more people are beginning to ask that question these days, including investors and analysts. There are a number of factors at play here. To begin with, there are more nodes to choose from than at ... » read more

Inside Samsung’s Foundry Biz
By Mark LaPedus - 23 Jul, 2015 - Comments: 0

Semiconductor Engineering sat down to talk about the foundry business, process technology, design and other topics with Hong Hao, senior vice president of the foundry business at [getentity id="22865" e_name="Samsung Semiconductor"]; and Kelvin Low, senior director of foundry marketing at Samsung Semiconductor. What follows are excerpts of that discussion. SE: The foundry business has alway... » read more

5 Technologies To Watch
By Mark LaPedus - 23 Jul, 2015 - Comments: 0

The industry is developing a dizzying array of new technologies. In fact, there are more new and innovative technologies than ever before. And the list is countless. At least from my vantage point, I have come up with my own list of the top five technologies to watch in 2015 and beyond. They are listed in alphabetical order. (See below). Obviously, there are more than just five technologi... » read more

Litho Challenges Break The Design-Process Wall
By Katherine Derbyshire - 22 Jun, 2015 - Comments: 3

The days when chip designers could throw tape “over the wall” to the manufacturing side are long gone. Over the last several technology generations, increasingly restrictive process kits have forced designers to accommodate their circuit structures to the manufacturing process. Lacking a successor to 193nm lithography, the industry has turned to increasingly complex resolution enhancemen... » read more

10nm Fab Challenges
By Mark LaPedus - 21 May, 2015 - Comments: 1

After a promising start in 2015, the semiconductor equipment industry is currently experiencing a slight lull. The pause is expected to be short-lived, however. Suppliers of [getkc id="208" comment="3D NAND"] devices are expected to add more fab capacity later this year. And about the same time, foundries are expected to order the first wave of high-volume production tools for 10nm. At 10nm... » read more

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