Nanoimprint-Based Dielectric Patterning for Fine-Pitch Hybrid Bonding (Seoul National Univ. of Science and Technology)


A new technical paper titled "Hybrid Bonding with Polymeric Interlayer Dielectric Layers Patterned by Nanoimprint Lithography" was published by researchers at Seoul National University of Science and Technology. Abstract "Recent advancements in semiconductor technology have shifted the focus of innovation toward advanced packaging technologies featuring heterogeneous integration. Among thes... » read more

Lithography Options For Next-Gen Devices


Chipmakers are ramping up extreme ultraviolet (EUV) lithography for advanced logic at 7nm and/or 5nm, but EUV isn’t the only lithographic option on the table. For some time, the industry has been working on an assortment of other next-generation lithography technologies, including a new version of EUV. Each technology is different and aimed at different applications. Some are here today, w... » read more

Overlay Control for Nanoimprint Lithography


Abstract: Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of "single" patterning for both line patterns and hole patterns with a half-pitch of less than 20nm. NIL tools for semiconductor manufacturing employ die- by-die alignment system ... » read more