tag: Siemens EDA

Wednesday At DAC 2018
By Brian Bailey - 28 Jun, 2018 - Comments: 0

Wednesday starts with a visionary talk followed by a keynote. The Visionary talk was given by Chidi Chidambaram, VP of engineering for Qualcomm, and looked at 'Challenges to Enable 5G System Scaling.' "We have to start taking a system view rather than just following technology and at the same time we have to get concerned about durability," he said. "Mobile will continue to be the leader becaus... » read more

Monday At DAC 2018
By Brian Bailey - 26 Jun, 2018 - Comments: 0

DAC #55 started with rumors flying. Will this be the last DAC as we know it? Is there a huge chasm forming between academia and the industry? Will DAC be able to make it in Las Vegas where there is no local interest? Of course, those who have been in the industry know that this kind of speculation happens every few years, and in the 80s, Las Vegas was a very popular location for DAC. There was ... » read more

The Coming Golden Age For Automotive E/E Design Services And Consulting
By Andrew Macleod - 03 May, 2018 - Comments: 0

By Andrew Macleod and Scott Majdecki The discipline of automotive E/E systems design is being transformed by trends like electrification and autonomous vehicles, which means there is a premium on methodologies like rapid platform (hardware/ software) prototyping, simulation and test, and electrical architecture optimization. Such methodologies hinge on advanced software design tools and the ... » read more

Blog Review: May 2
By Jesse Allen - 02 May, 2018 - Comments: 0

Arm's Greg Yeric looks towards the future of 3D ICs with a dive into transistor-level 3D, including the different proposed methods of stacking transistors, power/performance benefits, and challenges such as parasitic resistance. Mentor's Kurt Takara, Chris Kwok, Dominic Lucido, and Joe Hupcey III explain how a custom synchronizer methodology can help avoid CDC mistakes and errors in FPGA des... » read more

Design Rule Complexity Rising
By Ed Sperling - 19 Apr, 2018 - Comments: 0

Variation, edge placement error, and a variety of other issues at new process geometries are forcing chipmakers and EDA vendors to confront a growing volume of increasingly complex, and sometimes interconnected design rules to ensure chips are manufacturable. The number of rules has increased to the point where it's impossible to manually keep track of all of them, and that has led to new pr... » read more

New Shifts In Automotive Design
By Ann Mutschler - 05 Apr, 2018 - Comments: 1

Four big shifts in automotive design and usage are beginning to converge—electrification, increasing connectivity, autonomous driving and car sharing—creating a ripple effect across the automotive electronics supply chain. Over the past few years the electronic content of cars and other vehicles has surged, with electrical systems replacing traditional mechanical and electro-mechanical s... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 30 Mar, 2018 - Comments: 0

Chipmakers 3D NAND continues to gain steam, but is the industry headed towards a capacity glut in the overall NAND market? Time will tell. In any case, Toshiba is moving forward with its plans to invest in its Fab 6 facility in Japan. The fab will produce the company’s 96-layer 3D NAND devices. Then, Samsung plans to invest $7 billion to double the production capacity for NAND flash memor... » read more

Driving By Ethernet
By Ann Mutschler - 01 Feb, 2018 - Comments: 0

The race to add more sophisticated and safety-critical electronics into cars is forcing carmakers to revisit the communications systems within increasingly electrified and connected vehicles. Until very recently, communication between components within a vehicle was simplistic, and communication between vehicles was non-existent. All of that is changing quickly. Rapid and secure communicatio... » read more

Blog Review: Jan. 3
By Jesse Allen - 03 Jan, 2018 - Comments: 0

Ansys' Steve Pytel argues that increased signaling speeds and frequencies have led to signal integrity issues that circuit simulation alone cannot handle. Cadence's Paul McLellan dives into the details of Intel's 10nm process, including three layers of self-aligned quadruple patterning, contact-over-active-gate, and cobalt for contact fill. Mentor's Ron Press and Vidya Neerkundar argue th... » read more

Smarter DFT Infrastructure And Automation Emerge As Keys To Managing DFT Design Scaling
By Ron Press - 21 Dec, 2017 - Comments: 0

By Ron Press and Vidya Neerkundar The reality of DFT for large and complex SoCs has introduced new risk into design schedules. DFT teams end up in the critical path to tape out while waiting for portions of the design to be complete, and there are more DFT integration steps than ever before. The traditional approaches to DFT work on huge designs pose problems of repeatability and reliability... » read more

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