Researchers from Nagoya University, Boise State University, Korea Institute of Fusion Energy, Hitachi High-Tech Corp. and Princeton Plasma Physics Laboratory published a technical paper titled “Recent Progress in Atomic-Scale Controlled Plasma Processing.”
Abstract Excerpt:
“Atomic-scale control in plasma processing is becoming increasingly critical for fabricating of advanced semiconductor devices, particularly as the industry shifts toward three-dimensional (3D) architectures and high-aspect-ratio (HAR) structures. This review presents a comprehensive overview of recent developments in atomic-scale controlled plasma processes.”
Find the technical paper here. June 2026.
Kenji Ishikawa et al 2026 Jpn. J. Appl. Phys. 65 120801
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