DSA Moves Ahead


It can be difficult to make DSA structures other than uniform arrays. One solution is to print a grating over a large area, then use a “cut” mask to eliminate the unwanted features. The challenge, though, is that aligning the cut mask to an array of tightly spaced features, such as the fins for a FinFET transistor layer, can require extremely demanding overlay specifications. While reducing... » read more

Manufacturing Bits: Dec. 16


Space DSA NASA's Physical Science Research Program is taking directed self-assembly (DSA) technology to new heights. On the International Space Station, astronauts are exploring the development of nanoparticles suspended in magnetorheolocial (MR) fluids. MR fluids, which are a new class of smart materials, self-assemble into shapes in the presence of a magnetic field. With the technology, r... » read more

Transistor Options Narrow For 7nm


Chipmakers are currently ramping up silicon-based finFETs at the 16nm/14nm node, with plans to scale the same technology to 10nm. Now, the industry is focusing on the transistor options for 7nm and beyond. At one time, the leading contenders involved several next-generation transistor types. At present, the industry is narrowing down the options and one technology is taking a surprising lea... » read more

Counting And Controlling DSA Defects


If directed self-assembly is to succeed in semiconductor manufacturing, [gettech id="31046" t_name="DSA"] processes must achieve defect rates in line with the stringent requirements of sub-20nm device nodes. So far, they haven’t. However, it’s not yet clear whether the high defect rates represent a real obstacle, or are simply part of the development of any new, immature process technology... » read more

Litho Options Sparse After 10nm


Leading-edge foundries are ramping up their 16nm/14nm logic processes, with 10nm and 7nm in R&D. Barring a major breakthrough in [getkc id="80" comment="lithography"], chipmakers will use 193nm immersion and multiple patterning for both 16nm/14nm and 10nm. So now, chipmakers are focusing on the lithography options for 7nm. As before, the options include the usual suspects—[gettech id="... » read more

The Key To DSA


The block co-polymer most commonly used in directed self-assembly research ([gettech id="31046" t_name="DSA"]), PS-b-PMMA (poly(styrene-block-methyl methacrylate) is an excellent choice because the two component monomers have similar surface energies. The exposed top surface of the film helps to stabilize the segregated domains, making it relatively easy to achieve the lamellar line-and-space p... » read more

What Will That DSA Template Do, Anyway?


As directed self assembly techniques make the transition from line and space test patterns to the more complex structures seen in real devices, modeling is emerging as a significant issue. How will the co-polymers behave in the presence of a particular template pattern? While several laboratory-scale modeling methods exist, most are too computationally expensive to be used for large area str... » read more

What Happened To Next-Gen Lithography?


Chipmakers continue to march down the process technology curve. Using today’s optical lithography and multiple patterning, the semiconductor industry is scaling its leading-edge devices far beyond what was once considered possible. The question is how far can the industry extend 193nm immersion [getkc id="80" comment="lithography"] and multiple patterning before these technologies become t... » read more

More Problems Ahead


Semiconductor Engineering sat down to discuss future scaling problems with Lars Liebmann, a fellow at IBM; Adam Brand, managing director of transistor technology at Applied Materials; Karim Arabi, vice president of engineering at Qualcomm; and Srinivas Banna, a fellow for advanced technology architecture at GlobalFoundries. SE: There seems to be some debate in this group about whether we’r... » read more

DSA: Hype Or Revolution?


Directed self-assembly (DSA) has become the subject of a great deal of research attention in the lithography world, to the point where there were dedicated sessions at this year’s Advanced Lithography conference in February. So is this just another passing research fad, or is it a technology that will revolutionize semiconductor manufacturing? DSA utilizes a block copolymer that effectivel... » read more

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