The Week In Review: July 19


By Ed Sperling Synopsys rolled out a 28nm data converter IP portfolio for analog-to-digital and digital-to-analog converters, as well as integrated PLLs. Synopsys says the new architecture saves up to 76% of the power and 86% of area. Mentor Graphics added intelligent software-driven verification to its functional verification platform. New is the ability to automatically generate embedded ... » read more

Experts At The Table: SoC Prototyping


By Ann Steffora Mutschler System-Level Design sat down to discuss SoC prototyping with Hillel Miller, pre-silicon verification/emulation manager at Freescale Semiconductor; Frank Schirrmeister, group director, product marketing, system development suite at Cadence; and Mick Posner, director of product marketing at Synopsys. What follows are excerpts of that conversation. SLD: When it comes... » read more

A Tale Of Two Standards


By Ed Sperling It could well be one of the strangest developments in standards history. Two competing standards for power formats were rolled out in the middle of the last decade and aside from a few cries of foul they fell below the radar screen of most chip designers and architects for a half-dozen years. Fast forward to the present and the Common Power Format (CPF) and Unified Power Form... » read more

The New Hybrid World: Vision And Reality


SAN FRANCISCO—You know the famous scene from the movie “The Graduate,” in which a young Dustin Hoffman is offered investment advice by a businessman. “I want to say just one word to you…just one word. Are you listening? Plastics.” Today, Hoffman’s character Benjamin Braddock might hear two words: “Integrated objects.” At least that’s how Ross Bringans from PARC sees... » read more

The Week In Review: July 15


By Mark LaPedus There are more problems surfacing with extreme ultraviolet (EUV) lithography. Yes, the light source remains a problem, but the resists appear to be in decent shape. “The next challenge is the mask blank,” said Stefan Wurm, director of Sematech’s lithography program. The new problem involves ion beam deposition, which apparently is causing defects and overfill on EUV masks... » read more

Experts At The Table: Changes In The Ecosystem


By Ed Sperling Semiconductor Manufacturing & Design sat down with Michael Buehler-Garcia, director of design solutions marketing at Mentor Graphics; Seow Yin Lim, group director for marketing at Cadence; Kevin Kranen, director of strategic alliances at Synopsys, and Tom Quan, director at TSMC. What follows are excerpts of that conversation. SMD: Does the increasing collaboration in the ecos... » read more

The Week In Review: July 12


By Ed Sperling Cadence rolled a new version of its layout suite of tools for electrically aware designs, allowing design teams to check on electrical issues while the layout is being done. The company says this can reduce circuit design time by up to 30%, in addition to optimizing for performance and area. Cadence also announced a deal with Global Unichip, which successfully taped out a 20nm ... » read more

Experts At The Table: SoC Prototyping


By Ann Steffora Mutschler System-Level Design sat down to discuss SoC prototyping with Hillel Miller, pre-silicon verification/emulation manager at Freescale Semiconductor; Frank Schirrmeister, group director, product marketing, system development suite at Cadence; and Mick Posner, director of product marketing at Synopsys. What follows are excerpts of that conversation. SLD: Is it possib... » read more

Software Debug Gets Tricky


By Ann Steffora Mutschler As designs continue to grow in size and complexity, that complexity has led to an increasing number of processing cores. Additional cores, in turn, allow for additional software to be run on those cores, and debugging the software becomes critical. Traditionally, emulation has played a significant role in verifying that software against RTL code, and continues to d... » read more

Dealing With New Bottlenecks


By Ed Sperling While the number of options for improving efficiency and performance in designs continues to increase, the number of challenges in getting chips at advanced process nodes out the door is increasing, too. Thinner wires, routing congestion, more power domains, IP integration and lithography issues are conspiring to make design much more difficult than in the past. So why aren�... » read more

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