Computing Where Data Resides


Computational storage is starting to gain traction as system architects come to grips with the rising performance, energy and latency impacts of moving large amounts of data between processors and hierarchical memory and storage. According to IDC, the global datasphere will grow from 45 zettabytes in 2019 to 175 by 2025. But that data is essentially useless unless it is analyzed or some amou... » read more

Verification In The Open Source Era


Experts at the Table: Semiconductor Engineering sat down to discuss what open source verification means today and what it should evolve into, with Jean-Marie Brunet, senior director for the Emulation Division at Siemens EDA; Ashish Darbari, CEO of Axiomise; Simon Davidmann, CEO of Imperas Software; Serge Leef, program manager in the Microsystems Technology Office at DARPA; Tao Liu, staff hardwa... » read more

Waiting For Chiplet Standards


The need and desire for chiplets is increasing, but for most companies that shift will happen slowly until proven standards are in place. Interoperability and compatibility depend on many layers and segments of the supply chain coming to agreement. Unfortunately, fragmented industry requirements may lead to a plethora of solutions. Standards always have enabled increasing specialization. ... » read more

Demand for IC Resilience Drives Methodology Changes


Applications that demand safety, security, and resilience are driving new ways of thinking about design, verification, and the long-term reliability of chips on a mass scale. The need is growing for chips that can process more data faster, over longer periods of time, and often within a shrinking power budget. That, in turn, is forcing changes at multiple levels, at the architecture, design,... » read more

Aging Analysis Common Model Interface Gains Momentum


By Greg Curtis, Ahmed Ramadan, Ninad Pimparkar, and Jung-Suk Goo In February 2019, Siemens EDA wrote an article1 entitled “The Time Is Now for a Common Model Interface”. Since that time, we have continued to see increasing demand for aging analysis, not only in the traditional automotive space, but also in other areas of technology design, such as mobile communication and IoT application... » read more

Exercising State Machines with Command Sequences


Almost every non-trivial design contains at least one state machine, and exercising that state machine through its legal states, state transitions, and the different reasons for state transitions is key to verifying the design’s functionality. In some cases, we can exercise a state machine simply as a side-effect of performing normal operations on the design. In other cases, the state machine... » read more

Blog Review: March 24


Arm's Brian Cline points to a project with GlobalFoundries to demonstrate the feasibility and readiness of high-density, face-to-face, wafer-bonded 3D stacking technologies for high performance, energy-efficient designs. Synopsys' Taylor Armerding warns that while supply chain security risks aren't new, the recent SolarWinds breach should make everyone pay much more attention to dependencies... » read more

Blog Review: March 17


Synopsys' Chris Clark considers the growing number of automotive sensors and the cost/performance tradeoffs between edge computing capability, sensor fusion, sensor degradation, monitoring, and the maintenance of the software over the lifespan of a vehicle. Cadence's Paul McLellan checks out how the process of loading the bootstrap into memory has changed over the years, from hand-entered on... » read more

Deep Learning (DL) Applications In Photomask To Wafer Semiconductor Manufacturing


The Survey: 2021 Deep Learning Applications List by eBeam Initiative members is a list of current deep learning efforts that are being used in photomask to wafer semiconductor manufacturing. Examples come from ASML, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, Siemens Industries Software, Inc., Siemens EDA, STMicroelectronics, and TASMIT. Published by the eBeam Initiative Membe... » read more

Designing 2.5D Systems


As more designs hit the reticle limit, or suffer from decreasing yield, migrating to 2.5D designs may provide a path forward. But this kind of advanced packaging also comes with some additional challenges. How you adapt and change your design team may be determined by where your focus has been in the past, or what you are trying to achieve. There are business, organizational, and technical c... » read more

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