Manufacturing Bits: Aug. 10


EUV mask cleaning process TSMC has developed a new dry-clean technology for photomasks used in extreme ultraviolet (EUV) lithography, a move that appears to solve some major problems in the fab. TSMC and Samsung are in production with EUV lithography at advanced nodes, but there are still several challenges with the photomasks and other parts of the technology. Using 13.5nm wavelengths, EUV... » read more

Manufacturing Bits: Sept. 22


Superconductor puddles Superconductors are devices that have zero electrical resistance, making them attractive for a range of applications. But superconductors must be cooled down to temperatures near zero to work, which, in turn, limits their applications. High-temperature superconductors are more promising technologies, but once again, they must be cooled down to function. The industr... » read more

Manufacturing Bits: Dec. 10


Space Telescopes The James Webb Space Telescope, the follow-on mission to the Hubble Space Telescope, is a large, infrared-optimized space telescope. Slated for a launch date of 2018, Webb will find the first galaxies that were formed in the early Universe. Webb is a collaboration between NASA, the European Space Agency (ESA) and the Canadian Space Agency (CSA). Webb’s measurements will ... » read more