tag: 10nm

Executive Insight: Jack Harding
By Ed Sperling - 18 Aug, 2014 - Comments: 0

SE: What’s worrying you these days? Harding: One thing that bothers me is the cost of chip development on a per-chip basis. We seduce ourselves into thinking everything is wonderful because the cost per transistor is dropping in chunks. Gate costs are going down at every node. If you look at the secular trend, we’ve done a pretty good job putting a lot of stuff in a small space. In my bu... » read more

Signoff Intensity On The Rise
By The SE Staff - 15 Aug, 2014 - Comments: 2

By Ann Steffora Mutschler and Ed Sperling Lithography and signoff are crossing swords at 16/14nm and 10nm, creating new problems that raise questions about just how confident design teams will be when they sign off before tapeout — and how many respins are likely to follow. While designs at 20nm, 16nm and 14nm typically rely on colorless double patterning, at 10nm colors are mandatory. ... » read more

Why The Next Couple Process Nodes Are So Critical
By Ed Sperling - 14 Aug, 2014 - Comments: 0

In the greater scheme of things, one process node doesn't matter all that much. In fact, it has become common practice for big chipmakers to skip nodes for some of their chips as power issues becoming increasingly complex, time-to-market windows shrink and leapfrogging is viewed as a way to maximize resources while remaining über-competitive. But the next process node, and certainly the nex... » read more

What’s Next For Memory?
By Mark LaPedus - 14 Aug, 2014 - Comments: 4

Apple, Samsung and others are developing the next wave of smartphones and tablets. OEMs want to integrate new memory schemes that provide more bandwidth at lower power. But there are some challenges in the arena that are prompting memory makers to rethink their mobile DRAM roadmaps. The conventional wisdom was that memory makers would ship mobile DRAMs based on the new LPDDR4 interface stand... » read more

Pattern Matching: Blueprints For Further Success
By Mentor, a Siemens Business - 14 Aug, 2014 - Comments: 0

Design patterns have a wide variety of applications in the design, verification and test flows of IC development. From significantly reducing rule deck complexity to simplifying the task of avoiding known yield detractors to enhancing workflows such as design rule waiver recognition, pattern matching has become a useful tool throughout design, verification, and test process. Learn how Calibre P... » read more

Who’s Winning The FinFET Foundry Race?
By Mark LaPedus - 14 Aug, 2014 - Comments: 5

The leading-edge foundry business is challenging. For starters, foundry vendors require vast resources, gigantic fabs and lots of know-how. And yet, it’s still difficult to make money in this business. That has certainly proven to be the case in the planar transistor era, but the challenges and costs are escalating as foundry vendors begin to ramp up finFET technologies at the 16nm/14nm no... » read more

Improving 2.5D Components
By Ed Sperling - 07 Aug, 2014 - Comments: 1

A lot of attention is being focused on improving designs at established, well-tested nodes where processes are mature, yields are high, and costs are under control. So what does this mean to stacking die? For 2.5D architectures, plenty. For 3D, probably not much. Here’s why: The advantage of 2.5D is that it can utilize dies created at whatever node makes sense. While the initial discuss... » read more

Changing The Meaning Of Sign-Off
By Muhammad Zakir - 07 Aug, 2014 - Comments: 0

Chip development teams are faced with an ever-increasing number of power integrity and reliability challenges these days, especially as designs adopt FinFET technology. Even those with the most thorough sign-off checks often encounter unexpected surprises that quickly turn into tape-out hurdles, or worse yet, extensive re-design. The best way to avoid this scenario and ensure a smoother sign-of... » read more

IP Integration Challenges Rising
By Ann Mutschler - 24 Jul, 2014 - Comments: 0

It’s not just [getkc id="80" comment="lithography"] that is putting a crimp in sub-28nm designs. As more functions, features, transistors and software are added onto chips, the pressure to get chips out the door has forced chipmakers to lean more heavily on third-party IP providers. Results, as you might expect, have been mixed. The number of blocks has mushroomed, creating its own web of ... » read more

EDA’s Hedge Plays
By Ed Sperling - 24 Jul, 2014 - Comments: 0

While 14/16nm process technologies with finFETs and double patterning have pushed complexity to new heights, the move to 10nm fundamentally will change a number of very basic elements of the design through manufacturing flow—and EDA vendors will be caught in the middle of having to make hard choices between foundries, processes, packaging approaches, and potentially which markets to serve. ... » read more

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